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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 42, Iss. 19 — Jul. 1, 2003
  • pp: 4049–4058

High-performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition

Eberhard Spiller, Sherry L. Baker, Paul B. Mirkarimi, Victor Sperry, Eric M. Gullikson, and Daniel G. Stearns  »View Author Affiliations


Applied Optics, Vol. 42, Issue 19, pp. 4049-4058 (2003)
http://dx.doi.org/10.1364/AO.42.004049


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Abstract

An ion-beam deposition system has been used to fabricate Mo-Si multilayer coatings for masks and imaging optics to be used for extreme-ultraviolet lithography. In addition to high reflectivity and excellent profile control, ion-beam deposition has the capability to smooth rough substrates. For example, we achieved reflectivity of 66.8% on a substrate with 0.39-nm roughness. Smoothing can be further enhanced with a second ion source directed at the multilayer coating. The smoothing capabilities relax the requirement on the finish of the mirror and the mask substrates and could dramatically reduce the cost of these components. Thickness profile control is in the ±0.01% range, and the figure error added to the mirror substrate by errors in the multilayer thickness is less than 0.1 nm. Peak reflectivities obtained on smooth substrates are 67.5–68.6%.

© 2003 Optical Society of America

OCIS Codes
(110.3960) Imaging systems : Microlithography
(310.0310) Thin films : Thin films
(340.0340) X-ray optics : X-ray optics
(340.7470) X-ray optics : X-ray mirrors

History
Original Manuscript: January 30, 2003
Revised Manuscript: April 2, 2003
Published: July 1, 2003

Citation
Eberhard Spiller, Sherry L. Baker, Paul B. Mirkarimi, Victor Sperry, Eric M. Gullikson, and Daniel G. Stearns, "High-performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition," Appl. Opt. 42, 4049-4058 (2003)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-42-19-4049


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References

  1. E. J. Puik, M. J. van der Wiel, H. Zeijlemaker, J. Verhoeven, “Ion bombardment of x-ray multilayer coatings: comparison of ion etching and ion assisted deposition,” Appl. Surf. Sci. 47, 251–260 (1991). [CrossRef]
  2. E. Spiller, “Enhancement of the reflectivity of multilayer x-ray mirrors by ion polishing,” Opt. Eng. 29, 609–613 (1990). [CrossRef]
  3. E. Louis, A. E. Yakshin, P. C. Goerts, S. Oestreich, R. Stuik, E. L. Maas, M. J. Kessels, F. Bijkerk, M. Haidl, S. Muellender, M. Mertin, D. S. Schmitz, Frank, G. Ulm, “Progress in Mo/Si multilayer coating technology for EUVL optics,” in Emerging Lithographic Technologies IV, E. A. Dobisc, ed., Proc. SPIE3997, 406–411 (2000). [CrossRef]
  4. B. Schmiedekamp, A. Kloidt, H. J. Stock, U. Kleineberg, T. Döhring, M. Pröpper, S. Rahn, K. Higers, B. Heidemann, T. Tappe, U. Heinzmann, M. K. Krumrey, P. Müller, F. Scholze, K. F. Heidemann, “Electrom-beam deposited Mo/S multilayer x-ray mirrors and gratings,” Opt. Eng. 33, 1314–1321 (1994). [CrossRef]
  5. T. W. Barbee, S. Mrowka, M. C. Hettrick, “Molybdenum-silicon multilayer mirrors for the extreme ultraviolet,” Appl. Opt. 24, 883–886 (1985). [CrossRef]
  6. S. Bajt, J. Alameda, T. Barbee, W. M. Clift, J. A. Folta, B. Kaufmann, E. Spiller, “Improved reflectance and stability of Mo/Si multilayers,” Opt. Eng. 41, 1797–1804 (2002). [CrossRef]
  7. T. Feigl, S. A. Yulin, T. Kuhlmann, N. Kaiser, “Damage resistant and low-stress Si-based multilayer mirrors,” in Soft X-Ray and EUV Imaging Systems II, D. Tichenor, J. Folta, eds., Proc. SPIE4506, 121–126 (2001). [CrossRef]
  8. S. Braun, R. Dietsch, M. Haidl, T. Holz, H. Mai, S. Mullender, R. Scholz, “Mo/Si-multilayers for EUV applications prepared by pulsed laser deposition (PLD),” Microelectron. Eng. 57-58, 9–15 (2001). [CrossRef]
  9. P. A. Kearney, C. E. Moore, S. I. Tan, S. P. Vernon, R. A. Levesque, “Mask blanks for extreme ultraviolet lithography: ion beam sputter deposition of low defect density Mo/Si multilayers,” J. Vac. Sci. Technol. B 15, 2452–2454 (1997). [CrossRef]
  10. S. Braun, H. Mai, M. Moss, R. Scholz, A. Leson, “Mo/Si multilayers with different barrier layers for applications as extreme ultraviolet mirror,” Jpn. J. Appl. Phys. Part 1 41, 4074–4081 (2001). [CrossRef]
  11. A. Kloidt, H. J. Stock, U. Kleineberg, T. Dohring, M. Propper, B. Schmiedeskamp, U. Heinzmann, “Smoothing of interfaces in ultrathin Mo/Si multilayers by ion-bombardment,” Thin Solid Films 228, 154–157 (1993). [CrossRef]
  12. F. Eriksson, G. A. Johansson, H. M. Hertz, J. Birch, “Enhanced soft x-ray reflectivity of Cr/Sc multilayers by ion-assisted sputter deposition,” Opt. Eng. 41, 2903–2909 (2002). [CrossRef]
  13. V. Paret, P. Boher, R. Geyl, B. Vidal, M. Putero-Vuaroqueaux, E. Quesnel, J. Robic, “Characterization of optics and masks for the EUV lithography,” Microelectron. Eng. 61-62, 145–155 (2002). [CrossRef]
  14. P. B. Mirkarimi, E. A. Spiller, D. G. Stearns, V. Sperry, S. L. Baker, “An ion-assisted Mo-Si deposition process for planarizing reticle substrates for extreme ultraviolet lithography,” IEEE J. Quantum Electron. 37, 1514–1516 (2001). [CrossRef]
  15. E. L. Church, P. Z. Takacs, “Statistical and signal processing concepts in surface metrology,” in Optical Manufacturing Testing and Aspheric Optics, G. M. Sanger, ed., Proc. SPIE645, 107–115 (1986). [CrossRef]
  16. D. G. Stearns, “A stochastic model for thin film growth and erosion,” Appl. Phys. Lett. 62, 1745–1747 (1993). [CrossRef]
  17. D. G. Stearns, D. P. Gaines, D. W. Sweeney, E. M. Gullikson, “Nonspecular x-ray scattering in a multilayer-coated imaging system,” J. Appl. Phys. 84, 1003–1028 (1998). [CrossRef]
  18. D. G. Stearns, E. M. Gullikson, “Nonspecular scattering from extreme ultraviolet multilayer coatings,” Physica B 283, 84–91 (2000). [CrossRef]
  19. W. M. Tong, R. S. Williams, “Kinetics of surface growth: phenomenology, scaling, and mechanisms of smoothening and roughening,” Annu. Rev. Phys. Chem. 45, 401–438 (1994). [CrossRef]
  20. E. M. Gullikson, D. G. Stearns, D. P. Gaines, J. H. Underwood, “Nonspecular scattering from multilayer mirrors at normal incidence,” in Grazing Incidence and Multilayer X-Ray Optical Systems, R. B. Hoover, A. B. Walker, eds., Proc. SPIE3113, 412–419 (1997). [CrossRef]
  21. E. Spiller, S. Baker, E. Parra, C. Tarrio, “Smoothing of mirror substrates by thin film deposition,” in EUV, X-Ray, and Neutron Optics and Sources, C. A. McDonald, K. A. Goldberg, J. R. Maldonado, H. H. Chen-Mayer, S. P. Vernon, eds., Proc. SPIE3767, 143–153 (1999). [CrossRef]
  22. Veeco Instruments, Inc., Terminal Drive, Plainview, N.Y. 11801.
  23. J. H. Underwood, E. M. Gullikson, “High-resolution, high-flux, user friendly VLS beamline at the ALS for the 50-1300 eV energy region,” J. Electron Spectrosc. Relat. Phenom. 92, 265–272 (1998). [CrossRef]
  24. E. M. Gullikson, S. Mrowka, B. B. Kaufmann, “Recent developments in EUV reflectometry at the advanced light source,” in Emerging Lithographic Technologies V, E. A. Dobisz, ed., Proc. SPIE4343, 363–373 (2001). [CrossRef]
  25. E. M. Gullikson, J. Taylor, K. Blaedel, S. Baker, C. Larson, “EUV scattering from mask substrate roughness,” presented at the 1st International EUV Lithography Symposium, Dallas, Texas, 14–15 October 2002, available at http://www.sematech.org/public/resources/litho/euvl/meetings.htm .
  26. Digital Instruments, 112 Robin Hill Road, Santa Barbara, Calif. 93117.
  27. R. S. Rosen, D. G. Stearns, M. A. Viliardos, M. E. Kasner, S. P. Vernon, Y. Cheng, “Silicide layer growth rates in Mo/Si multilayers,” Appl. Opt. 32, 6975–6980 (1993). [CrossRef] [PubMed]
  28. B. L. Henke, E. M. Gullikson, J. C. Davis, “X-ray interactions: photoabsorption, scattering, transmission, and reflection at E = 50–30 000 eV, Z = 1–92,” At. Data Nucl. Data Tables 54, 181–424 (1993); updated at http://www-cxro.lbl.gov/optical_constants .
  29. Thin Film Analysys, Inc., 5150 Shadow Estate, San Jose, Calif. 95135.
  30. P. B. Mirkarimi, S. Bajt, M. A. Wall, “Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography,” Appl. Opt. 39, 1617–1625 (2000). [CrossRef]
  31. P. P. Naulleau, E. H. Anderson, E. M. Gullikson, J. Bokor, “Fabrication of high-efficiency multilayer-coated binary blazed gratings in the EUV regime,” Opt. Commun. 200, 27–34 (2001). [CrossRef]
  32. P. P. Naulleau, J. A. Liddle, E. H. Anderson, E. M. Gullikson, F. Salmassi, Lawrence Berkeley National Laboratory, Berkeley, Calif. 94720, and P. Mirkarimiand, E. Spiller, Lawrence Livermore National Laboratory, Livermore, Calif. 94551, “Fabrication of high-efficiency multilayer-coated gratings for the EUV regime using e-beam patterned substrates (to be submitted to Appl. Opt.).
  33. R. Soufli, E. Spiller, M. A. Schmidt, C. Davidson, R. F. Grabner, E. M. Gullikson, B. B. Kaufmann, S. Mrowka, S. L. Baker, H. N. Chapman, R. M. Hudyma, J. S. Taylor, C. C. Walton, C. Montcalm, J. A. Folta, “Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution,” in Emerging Lithographic Technologies V, E. A. Dobisc, ed. Proc. SPIE4343, 51–59 (2001). [CrossRef]
  34. Research Electro-Optics, 1855 South 57th Court, Boulder, Colo. 80501.

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