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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 42, Iss. 22 — Aug. 1, 2003
  • pp: 4580–4583

Evaluation of the oxidation of TiO2 films during reactive evaporation of Ti3O5 and during exposure of the films to the atmosphere

Robert Linsbod, Elmar Ritter, and Klaus Leitner  »View Author Affiliations


Applied Optics, Vol. 42, Issue 22, pp. 4580-4583 (2003)
http://dx.doi.org/10.1364/AO.42.004580


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Abstract

A surplus amount of oxygen is needed to produce titanium dioxide films by reactive electron-beam evaporation of Ti3O5. We investigated the ratio of the rates at which oxygen molecules and TiO x molecules impinge upon substrates at 25° and 250 °C to produce TiO2 films that show no optical absorption in the visible spectral region. On unheated substrates the ratio was 49, and at 250 °C it was 26, provided that the substrates had been exposed to air after being coated at the given substrate temperature. Higher ratios were required if the TiO2 film was covered with a SiO2 film, which impeded further oxidation. Furthermore, the postdeposition oxidation behavior of these films was studied.

© 2003 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties

History
Original Manuscript: January 3, 2003
Revised Manuscript: April 11, 2003
Published: August 1, 2003

Citation
Robert Linsbod, Elmar Ritter, and Klaus Leitner, "Evaluation of the oxidation of TiO2 films during reactive evaporation of Ti3O5 and during exposure of the films to the atmosphere," Appl. Opt. 42, 4580-4583 (2003)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-42-22-4580


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References

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  8. K. Kerner, G. Mutschler, “Oxydation von Aluminium bei reaktivem Aufdampfen in Sauerstoff,” Bosch Tech. Ber. 3, 3–9 (1970).

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