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Applied Optics

Applied Optics


  • Vol. 42, Iss. 22 — Aug. 1, 2003
  • pp: 4580–4583

Evaluation of the oxidation of TiO2 films during reactive evaporation of Ti3O5 and during exposure of the films to the atmosphere

Robert Linsbod, Elmar Ritter, and Klaus Leitner  »View Author Affiliations

Applied Optics, Vol. 42, Issue 22, pp. 4580-4583 (2003)

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A surplus amount of oxygen is needed to produce titanium dioxide films by reactive electron-beam evaporation of Ti3O5. We investigated the ratio of the rates at which oxygen molecules and TiO x molecules impinge upon substrates at 25° and 250 °C to produce TiO2 films that show no optical absorption in the visible spectral region. On unheated substrates the ratio was 49, and at 250 °C it was 26, provided that the substrates had been exposed to air after being coated at the given substrate temperature. Higher ratios were required if the TiO2 film was covered with a SiO2 film, which impeded further oxidation. Furthermore, the postdeposition oxidation behavior of these films was studied.

© 2003 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties

Original Manuscript: January 3, 2003
Revised Manuscript: April 11, 2003
Published: August 1, 2003

Robert Linsbod, Elmar Ritter, and Klaus Leitner, "Evaluation of the oxidation of TiO2 films during reactive evaporation of Ti3O5 and during exposure of the films to the atmosphere," Appl. Opt. 42, 4580-4583 (2003)

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  1. D. C. Cronemeyer, “Infrared absorption of reduced rutile TiO2 single crystals,” Phys. Rev. 113, 1222–1226 (1959). [CrossRef]
  2. V. N. Bogomolov, D. N. Mirlin, “Optical absorption by polarons in rutile (TiO2) single crystals,” Phys. Status Solidi 27, 443–453 (1968). [CrossRef]
  3. H. K. Pulker, G. Paesold, E. Ritter, “Refractive indices of TiO2 films produced by reactive evaporation of various titanium-oxygen phases,” Appl. Opt. 15, 2986–2991 (1976). [CrossRef] [PubMed]
  4. H. W. Lehmann, K. Frick, “Optimizing deposition parameters of electron beam evaporated TiO2 films,” Appl. Opt. 27, 4920–4924 (1988). [CrossRef] [PubMed]
  5. Leybold-Heraeus catalog 19989, “Grundlagen der Vakuumtechnik, Berechnungen und Tabellen,” edition 01.86 (Leybold-Heraeus GmbH, Hanau, Germany, 1986), p. 77.
  6. H. Selhofer, E. Ritter, R. Linsbod, “Properties of titanium dioxide films prepared by reactive electron-beam evaporation from various starting materials,” Appl. Opt. 41, 756–762 (2002). [CrossRef] [PubMed]
  7. E. Ritter, “Deposition of oxide films by reactive evaporation,” J. Vac. Sci. Technol. 3, 225–226 (1966). [CrossRef]
  8. K. Kerner, G. Mutschler, “Oxydation von Aluminium bei reaktivem Aufdampfen in Sauerstoff,” Bosch Tech. Ber. 3, 3–9 (1970).

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