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Applied Optics

Applied Optics


  • Vol. 42, Iss. 22 — Aug. 1, 2003
  • pp: 4584–4589

Characterization of thin-film losses with a synchronously pumped ringdown cavity

Georgiy Vaschenko, Yogesh Godwal, Carmen S. Menoni, Claude Montcalm, Richard Blacker, and Daniel Siegfried  »View Author Affiliations

Applied Optics, Vol. 42, Issue 22, pp. 4584-4589 (2003)

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We describe the use of a synchronously pumped ringdown cavity for measuring total optical losses, absorption and scattering, in thin optical films of arbitrary thickness on transparent substrates. This technique is compared with a single-pulse ringdown cavity regime and is shown to have a superior signal-to-noise ratio and resolution. We also provide an analysis of the factors affecting the resolution of the technique. Using this ringdown cavity pumped by a conventional mode-locked Ti:sapphire laser, we experimentally detect losses of only 58 ± 9 and 112 ± 9 parts per million in Ta2O5 and SiO2 films, respectively. To our knowledge, these are so far the lowest losses measured in thin films on stand-alone transparent substrates.

© 2003 Optical Society of America

OCIS Codes
(300.1030) Spectroscopy : Absorption
(300.6250) Spectroscopy : Spectroscopy, condensed matter
(310.6860) Thin films : Thin films, optical properties

Original Manuscript: January 20, 2003
Revised Manuscript: April 17, 2003
Published: August 1, 2003

Georgiy Vaschenko, Yogesh Godwal, Carmen S. Menoni, Claude Montcalm, Richard Blacker, and Daniel Siegfried, "Characterization of thin-film losses with a synchronously pumped ringdown cavity," Appl. Opt. 42, 4584-4589 (2003)

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