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Applied Optics

Applied Optics


  • Vol. 42, Iss. 22 — Aug. 1, 2003
  • pp: 4590–4593

Properties of TiO x films prepared by electron- beam evaporation of titanium and titanium suboxides

Friedrich Waibel, Elmar Ritter, and Robert Linsbod  »View Author Affiliations

Applied Optics, Vol. 42, Issue 22, pp. 4590-4593 (2003)

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The titanium suboxides TiO, Ti2O3, and Ti3O5 are widely used to produce films of titanium dioxide by reactive evaporation. If they are evaporated in high vacuum, however, they yield absorbing TiO x films with a transmission color varying between blue and gray. We investigated the specific properties of these TiO x films. TiO, Ti2O3, Ti3O5, and titanium metal were evaporated in high vacuum upon glass substrates at 25° and 250 °C. Differences in chemical composition, transmission and reflection, color, stress, and abrasion resistance of these films, depending on the starting material and the substrate temperature, were evaluated.

© 2003 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties

Original Manuscript: January 3, 2003
Revised Manuscript: April 11, 2003
Published: August 1, 2003

Friedrich Waibel, Elmar Ritter, and Robert Linsbod, "Properties of TiOx films prepared by electron- beam evaporation of titanium and titanium suboxides," Appl. Opt. 42, 4590-4593 (2003)

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  1. S. Chiao, B. Bovard, H. A. Macleod, “Repeatability of the composition of titanium oxide films produced by evaporation of Ti2O3,” Appl. Opt. 37, 5284–5290 (1998). [CrossRef]
  2. H. Selhofer, “Titanium oxides for optical-interference coatings,” Vac. Thin Films 2, 15–19 (1999).
  3. J. F. O’Hanlon, User’s Guide to Vacuum Technology (Wiley, New York, 1980), p. 211.
  4. N. T. M. Dennis, T. A. Heppel, Vacuum System Design (Chapman Hall, London, 1968), pp. 41–42.
  5. H. Bollinger, W. Teubner, eds., Industrielle Vakuumtechnik (VEB, Leipzig, 1980), p. 225.
  6. G. Hass, “Preparation, properties and optical applications of thin films of titanium dioxide,” Vacuum 11, 331–345 (1952). [CrossRef]
  7. E. Ritter, “Deposition of oxide films by reactive evaporation,” J. Vac. Sci. Technol. 3, 225–226 (1966). [CrossRef]
  8. H. K. Pulker, G. Paesold, E. Ritter, “Refractive indices of TiO2 films produced by reactive evaporation of various titanium-oxygen phases,” Appl. Opt. 15, 2986–2991 (1976). [CrossRef] [PubMed]
  9. T. Aoki, S. Ogura, “In-situ stress and spectral characteristics of optical TiO2 thin films from various starting materials,” in Optical Interference Coatings, Vol. 9 of 1998 OSA Technical Digest Series (Optical Society of America, Washington, D.C., 1998), pp. 207–209.
  10. T. Aoki, “Study of thin film starting material with ‘in situ’ stress and ‘in situ’ optical measurement,” Ph.D. dissertation (Kobe Design University, Kobe, Japan, 1999; in Japanese).

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