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Applied Optics

Applied Optics


  • Vol. 42, Iss. 24 — Aug. 20, 2003
  • pp: 4835–4840

Method for measuring small optical absorption coefficients with use of a Shack-Hartmann wave-front detector

Sanichiro Yoshida, David H. Reitze, David B. Tanner, and Justin D. Mansell  »View Author Affiliations

Applied Optics, Vol. 42, Issue 24, pp. 4835-4840 (2003)

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We present a method for measuring absorption at the 1 × 10-5 cm-1 level in high-quality optical materials. Using a Shack-Hartmann wave-front detector, thermal lensing in these materials may be measured. Then, the absorption coefficient may be estimated by fitting the observed deformation to a thermal lensing model based on the temperature dependences of the refractive index and the thermal expansion coefficient. For a particular sample of fused silica, the absorption coefficient was determined to be 1.8 ± 0.4 × 10-5 cm-1. Obtaining this result requires a resolution in the optical path length better than ±0.1 nm.

© 2003 Optical Society of America

OCIS Codes
(160.4670) Materials : Optical materials
(160.6030) Materials : Silica
(260.3060) Physical optics : Infrared
(350.6830) Other areas of optics : Thermal lensing

Original Manuscript: January 28, 2003
Revised Manuscript: May 16, 2003
Published: August 20, 2003

Sanichiro Yoshida, David H. Reitze, David B. Tanner, and Justin D. Mansell, "Method for measuring small optical absorption coefficients with use of a Shack-Hartmann wave-front detector," Appl. Opt. 42, 4835-4840 (2003)

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