We have developed an approach for relatively rapid and easy fabrication of large-area two-dimensional (2-D) photonic crystal structures with controlled defects in the lattice. The technique is based on the combination of two lithographic steps in UV-sensitive SU-8 photoresist. First, multiple exposures of interference fringes are used in combination with precise rotation of the sample to define a 2-D lattice of holes. Second, a strongly focused UV laser beam is used to define line-defect waveguides by localized exposure in the recorded but not yet developed lattice from the first step. After development, the mask is transferred into a GaAs substrate with dry etching in chemically assisted ion-beam etching.
© 2003 Optical Society of America
(090.0090) Holography : Holography
(130.3120) Integrated optics : Integrated optics devices
(230.4000) Optical devices : Microstructure fabrication
(250.5300) Optoelectronics : Photonic integrated circuits
Lin Pang, Wataru Nakagawa, and Yeshaiahu Fainman, "Fabrication of Two-Dimensional Photonic Crystals with Controlled Defects by Use of Multiple Exposures and Direct Write," Appl. Opt. 42, 5450-5456 (2003)