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Applied Optics

Applied Optics


  • Vol. 42, Iss. 27 — Sep. 20, 2003
  • pp: 5450–5456

Fabrication of two-dimensional photonic crystals with controlled defects by use of multiple exposures and direct write

Lin Pang, Wataru Nakagawa, and Yeshaiahu Fainman  »View Author Affiliations

Applied Optics, Vol. 42, Issue 27, pp. 5450-5456 (2003)

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We have developed an approach for relatively rapid and easy fabrication of large-area two-dimensional (2-D) photonic crystal structures with controlled defects in the lattice. The technique is based on the combination of two lithographic steps in UV-sensitive SU-8 photoresist. First, multiple exposures of interference fringes are used in combination with precise rotation of the sample to define a 2-D lattice of holes. Second, a strongly focused UV laser beam is used to define line-defect waveguides by localized exposure in the recorded but not yet developed lattice from the first step. After development, the mask is transferred into a GaAs substrate with dry etching in chemically assisted ion-beam etching.

© 2003 Optical Society of America

OCIS Codes
(090.0090) Holography : Holography
(130.3120) Integrated optics : Integrated optics devices
(230.4000) Optical devices : Microstructure fabrication
(250.5300) Optoelectronics : Photonic integrated circuits

Original Manuscript: March 6, 2003
Revised Manuscript: May 23, 2003
Published: September 20, 2003

Lin Pang, Wataru Nakagawa, and Yeshaiahu Fainman, "Fabrication of two-dimensional photonic crystals with controlled defects by use of multiple exposures and direct write," Appl. Opt. 42, 5450-5456 (2003)

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