Ion-Beam Etching for the Precise Manufacture of Optical Coatings: Erratum
Applied Optics, Vol. 42, Issue 28, pp. 5749-5749 (2003)
http://dx.doi.org/10.1364/AO.42.005749
Acrobat PDF (200 KB)
Abstract
In our previous publication [Poitras et al. Appl. Opt. 42, 4037–4044 (2003)], an incorrect version of Fig. 8 was printed. The correct version of the figure is presented here.
© 2003 Optical Society of America
OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
Citation
Daniel Poitras, J. A. Dobrowolski, Tom Cassidy, and Simona Moisa, "Ion-Beam Etching for the Precise Manufacture of Optical Coatings: Erratum," Appl. Opt. 42, 5749-5749 (2003)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-42-28-5749
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
Related Journal Articles 
- Process-Parameter-Dependent Optical and Structural Properties of ZrO2 MgO Mixed-Composite Films Evaporated from the Solid Solution (AO)
- MgO-Al2O3-ZrO2 Amorphous Ternary Composite: A Dense and Stable Optical Coating (AO)
- Interference Coatings Based on Synthesized Silicon Nitride (AO)
- Serial Bideposition of Anisotropic Thin Films with Enhanced Linear Birefringence (AO)
- Hexamethyldisiloxane Film as the Bottom Antireflective Coating Layer for ArF Excimer Laser Lithography (AO)
Related Conference Papers
- Near field effects in UV and Visible laser assisted deposition of DLC
- High throughput deposition of precision optical coatings using closed field magnetron sputtering
- Structural and optical properties of titanium dioxide films produced by RAS (Radical Assisted Sputtering) coater
- Large area sol-gel optical coatings for french high power laser drivers
- The use of optical coatings in projection systems
« Previous Article | Next Article »
OSA is a member of 