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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 42, Iss. 28 — Oct. 1, 2003
  • pp: 5749–5749

Ion-beam etching for the precise manufacture of optical coatings: erratum

Daniel Poitras, J. A. Dobrowolski, Tom Cassidy, and Simona Moisa  »View Author Affiliations


Applied Optics, Vol. 42, Issue 28, pp. 5749-5749 (2003)
http://dx.doi.org/10.1364/AO.42.005749


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Abstract

In our previous publication [Poitras. Appl. Opt. 42, 4037–4044 (2003)], an incorrect version of Fig. 8 was printed. The correct version of the figure is presented here.

© 2003 Optical Society of America

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication

History
Original Manuscript: July 9, 2003
Published: October 1, 2003

Citation
Daniel Poitras, J. A. Dobrowolski, Tom Cassidy, and Simona Moisa, "Ion-beam etching for the precise manufacture of optical coatings: erratum," Appl. Opt. 42, 5749-5749 (2003)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-42-28-5749

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