A technique for developing recording gratings <i>in situ</i> in Photoresist Shipley S-1822 is described. The developing process is accomplished by use of a spray without removing the sample from the optical setup. The results for the diffraction efficiency show that there is not a large difference between gratings achieved with the traditional wet development process and those obtained with the <i>in situ</i> developing technique. The potential of this <i>in situ</i> developing technique is shown with a moiré interferometric experimental setup used for displacement showing.
© 2003 Optical Society of America
(050.1950) Diffraction and gratings : Diffraction gratings
(120.2880) Instrumentation, measurement, and metrology : Holographic interferometry
(120.4120) Instrumentation, measurement, and metrology : Moire' techniques
(160.2900) Materials : Optical storage materials
Juan Antonio Rayas, Amalia Martínez, Ramón Rodríguez-Vera, and Sergio Calixto, "Development in situ for Gratings Recorded in Photoresist," Appl. Opt. 42, 6877-6879 (2003)