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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 42, Iss. 34 — Dec. 1, 2003
  • pp: 6877–6879

Development in situ for gratings recorded in photoresist

Juan Antonio Rayas, Amalia Martínez, Ramón Rodríguez-Vera, and Sergio Calixto  »View Author Affiliations


Applied Optics, Vol. 42, Issue 34, pp. 6877-6879 (2003)
http://dx.doi.org/10.1364/AO.42.006877


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Abstract

A technique for developing recording gratings in situ in Photoresist Shipley S-1822 is described. The developing process is accomplished by use of a spray without removing the sample from the optical setup. The results for the diffraction efficiency show that there is not a large difference between gratings achieved with the traditional wet development process and those obtained with the in situ developing technique. The potential of this in situ developing technique is shown with a moiré interferometric experimental setup used for displacement showing.

© 2003 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.2880) Instrumentation, measurement, and metrology : Holographic interferometry
(120.4120) Instrumentation, measurement, and metrology : Moire' techniques
(160.2900) Materials : Optical storage materials

History
Original Manuscript: May 8, 2003
Revised Manuscript: August 14, 2003
Published: December 1, 2003

Citation
Juan Antonio Rayas, Amalia Martínez, Ramón Rodríguez-Vera, and Sergio Calixto, "Development in situ for gratings recorded in photoresist," Appl. Opt. 42, 6877-6879 (2003)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-42-34-6877


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References

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  11. K. M. Hung, C. C. Ma, “Theoretical analysis and digital photoelastic measurement of circular disks subjected to partially distributed compressions,” Exp. Mech. 43, 216–224 (2003).

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