Absorption of Low-Loss Optical Materials Measured at 1064 nm by a Position-Modulated Collinear Photothermal Detection Technique
Applied Optics, Vol. 42, Issue 4, pp. 649-656 (2003)
http://dx.doi.org/10.1364/AO.42.000649
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Abstract
A collinear photothermal detection bench is described that makes use of a position-modulated heating source instead of the classic power-modulated source. This new modulation scheme increases by almost a factor 2 the sensitivity of a standard mirage bench. This bench is then used to measure the absorption coefficient of OH-free synthetic fused silica at 1064 nm in the parts per 106 range, which, combined with spectrophotometric measurements, confirms that the dominant absorption source is the OH content.
© 2003 Optical Society of America
OCIS Codes
(120.3940) Instrumentation, measurement, and metrology : Metrology
(160.4760) Materials : Optical properties
(160.6030) Materials : Silica
Citation
Vincent Loriette and Claude Boccara, "Absorption of Low-Loss Optical Materials Measured at 1064 nm by a Position-Modulated Collinear Photothermal Detection Technique," Appl. Opt. 42, 649-656 (2003)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-42-4-649
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