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Applied Optics

Applied Optics


  • Vol. 42, Iss. 6 — Feb. 20, 2003
  • pp: 1132–1139

Nonlinear and bistable reflection minima at λ = 10.6 μm in an attenuated total reflection configuration with a highly doped n-GaAs Film

Gennady Shkerdin, Johan Stiens, and Roger Vounckx  »View Author Affiliations

Applied Optics, Vol. 42, Issue 6, pp. 1132-1139 (2003)

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n-GaAs can be so highly doped that its plasma frequency is larger than the associated frequency of a CO2 laser emission line, leading to a negative real part of the dielectric permittivity. We studied linear and nonlinear reflection properties of structures composed of such thin highly doped n-GaAs film in an attenuated total reflection (ATR) configuration. We show that deep reflection minima coincide with the excitation of Brewster-type modes of the multilayer structure. These minima feature strong nonlinear and bistable behavior and are sensitive to geometrical and material parameters. The proposed ATR configuration can be used to determine doping concentrations with an accuracy of better than 1 part per thousand and different deformation potentials of the higher-conduction bands in n-GaAs.

© 2003 Optical Society of America

OCIS Codes
(160.6000) Materials : Semiconductor materials
(190.1450) Nonlinear optics : Bistability
(310.6860) Thin films : Thin films, optical properties

Original Manuscript: June 22, 2002
Revised Manuscript: October 29, 2002
Published: February 20, 2003

Gennady Shkerdin, Johan Stiens, and Roger Vounckx, "Nonlinear and bistable reflection minima at λ = 10.6 μm in an attenuated total reflection configuration with a highly doped n-GaAs Film," Appl. Opt. 42, 1132-1139 (2003)

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