High-Resolution Photometric Optical Monitoring for Thin-Film Deposition
Applied Optics, Vol. 43, Issue 1, pp. 143-148 (2004)
http://dx.doi.org/10.1364/AO.43.000143
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Abstract
Real-time monitoring of thin-film deposition with high resolution is important for precise fabrication of thin-film devices in a technological environment with ever-increasing demands for smaller size and better performance. Using photometry, we were able to achieve a real-time optical monitoring resolution of film thickness that is comparable with a single atomic layer scale (i.e., subnanometer). Filtering noise efficiently and compensating for sources of error by use of an appropriate model produced this high resolution. The procedure proved reliable and can be useful in the thin-film-deposition industry.
© 2004 Optical Society of America
OCIS Codes
(240.0310) Optics at surfaces : Thin films
(290.3030) Scattering : Index measurements
(300.6320) Spectroscopy : Spectroscopy, high-resolution
(310.1860) Thin films : Deposition and fabrication
Citation
Rabi Rabady, Kirill Zinoviev, and Ivan Avrutsky, "High-Resolution Photometric Optical Monitoring for Thin-Film Deposition," Appl. Opt. 43, 143-148 (2004)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-43-1-143
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