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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 43, Iss. 1 — Jan. 1, 2004
  • pp: 143–148

High-resolution photometric optical monitoring for thin-film deposition

Rabi Rabady, Kirill Zinoviev, and Ivan Avrutsky  »View Author Affiliations


Applied Optics, Vol. 43, Issue 1, pp. 143-148 (2004)
http://dx.doi.org/10.1364/AO.43.000143


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Abstract

Real-time monitoring of thin-film deposition with high resolution is important for precise fabrication of thin-film devices in a technological environment with ever-increasing demands for smaller size and better performance. Using photometry, we were able to achieve a real-time optical monitoring resolution of film thickness that is comparable with a single atomic layer scale (i.e., subnanometer). Filtering noise efficiently and compensating for sources of error by use of an appropriate model produced this high resolution. The procedure proved reliable and can be useful in the thin-film-deposition industry.

© 2004 Optical Society of America

OCIS Codes
(240.0310) Optics at surfaces : Thin films
(290.3030) Scattering : Index measurements
(300.6320) Spectroscopy : Spectroscopy, high-resolution
(310.1860) Thin films : Deposition and fabrication

History
Original Manuscript: May 23, 2003
Revised Manuscript: August 25, 2003
Published: January 1, 2004

Citation
Rabi Rabady, Kirill Zinoviev, and Ivan Avrutsky, "High-resolution photometric optical monitoring for thin-film deposition," Appl. Opt. 43, 143-148 (2004)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-43-1-143

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