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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 43, Iss. 17 — Jun. 10, 2004
  • pp: 3474–3479

Asymmetric phase masks for extended depth of field

Albertina Castro and Jorge Ojeda-Castañeda  »View Author Affiliations


Applied Optics, Vol. 43, Issue 17, pp. 3474-3479 (2004)
http://dx.doi.org/10.1364/AO.43.003474


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Abstract

We present a family of asymmetric phase masks that extends the depth of field of an optical system. To verify our proposal, we compute several modulation transfer functions with focus errors, and we report numerical simulations of the images that can be achieved by use of our proposed procedure.

© 2004 Optical Society of America

OCIS Codes
(110.0110) Imaging systems : Imaging systems
(110.1220) Imaging systems : Apertures
(110.4100) Imaging systems : Modulation transfer function

History
Original Manuscript: August 27, 2003
Revised Manuscript: January 20, 2004
Published: June 10, 2004

Citation
Albertina Castro and Jorge Ojeda-Castañeda, "Asymmetric phase masks for extended depth of field," Appl. Opt. 43, 3474-3479 (2004)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-43-17-3474

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