a-Si:H/SiO2 Multilayer Films Fabricated by Radio-Frequency Magnetron Sputtering for Optical Filters
Applied Optics, Vol. 43, Issue 17, pp. 3548-3554 (2004)
http://dx.doi.org/10.1364/AO.43.003548
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Abstract
We examined the optical properties of a-Si:H/SiO2 multilayer films fabricated by radio-frequency magnetron sputtering for optical bandpass filters (BPFs). Because of the high refractive-index contrast between a-Si:H and SiO2, the total number of layers of an a-Si:H/SiO2 multilayer can be relatively small. We obtained an a-Si:H refractive index of 3.6 at λ = 1550 nm and its extinction coefficient k < 1 × 10−4 and confirmed by Fourier-transform infrared spectroscopy that such small k is influenced by the Si-H bonding in the film. We fabricated a-Si:H/SiO2 BPFs by using in situ optical monitoring. Thermal tuning of a-Si:H/SiO2 BPF upon a silica substrate was also performed, and a thermal tunability coefficient of 0.07 nm/°C was obtained.
© 2004 Optical Society of America
OCIS Codes
(060.4230) Fiber optics and optical communications : Multiplexing
(230.4170) Optical devices : Multilayers
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
Citation
Hidehiko Yoda, Kazuo Shiraishi, Yuji Hiratani, and Osamu Hanaizumi, "a-Si:H/SiO2 Multilayer Films Fabricated by Radio-Frequency Magnetron Sputtering for Optical Filters," Appl. Opt. 43, 3548-3554 (2004)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-43-17-3548
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