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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 43, Iss. 20 — Jul. 9, 2004
  • pp: 3978–3982

High-Accuracy Measurement of the Optical Transmittance of Optical Bulk Materials at Deep-Ultraviolet Wavelengths

Ulrich Neukirch and Xinghua Li  »View Author Affiliations


Applied Optics, Vol. 43, Issue 20, pp. 3978-3982 (2004)
http://dx.doi.org/10.1364/AO.43.003978


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Abstract

A measurement setup that is capable of measuring the internal transmittance of fused-silica prisms at 193 nm with a precision better than 0.01%/cm (3ς) is presented. Its application to materials and wavelengths other than those that were chosen here for demonstration is straightforward. A lack of any standards makes it impossible to determine the absolute accuracy (also called measurement uncertainty) experimentally; however, calculations indicate that it is almost within the same margin as the precision.

© 2004 Optical Society of America

OCIS Codes
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.7000) Instrumentation, measurement, and metrology : Transmission
(260.7190) Physical optics : Ultraviolet

Citation
Ulrich Neukirch and Xinghua Li, "High-Accuracy Measurement of the Optical Transmittance of Optical Bulk Materials at Deep-Ultraviolet Wavelengths," Appl. Opt. 43, 3978-3982 (2004)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-43-20-3978


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References

  1. Hitachi product information for U-4100 UV-Visible-NIR spectrophotometer, Publ. HTB-E013 2002.3 (Hitachi, Tokyo, 2002).
  2. F. Manoochehri and F. Ikonen, “High-accuracy spectrometer for measurement of regular spectral transmittance,” Appl. Opt. 34, 3686–3692 (1995).
  3. G. L. Bucher and S. L. Logunov, “Method and apparatus for measuring internal transmittance,” Patent Cooperation Treaty publ. WO 00/57158 (World Intellectual Property Organization, Geneva, Switzerland, 28 September 2000).
  4. C. M. Smith, N. F. Borrelli, and R. J. Araujo, “Transient absorption in excimer-exposed silica,” Appl. Opt. 39, 5778–5784 (2000).
  5. M. Ogawa, “Absorption cross sections of O2 and CO2 continua in the Schumann and far-UV regions,” J. Chem. Phys. 54, 2550–2556 (1971).
  6. T. G. Slanger, L. E. Jusinski, G. Black, and G. E. Gadd, “A new laboratory source of ozone and its potential atmospheric implications,” Science 241, 945–950 (1988).
  7. L. R. Canfield, R. E. Vest, R. Korde, H. Schmidtke, and R. Desor, “Absolute silicon photodiodes for 160 nm to 254 nm photons,” Metrologia 35, 329–334 (1998).

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