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Applied Optics

Applied Optics


  • Vol. 43, Iss. 28 — Oct. 1, 2004
  • pp: 5323–5329

Design, fabrication, and characterization of high-efficiency extreme-ultraviolet diffusers

Patrick P. Naulleau, J. Alexander Liddle, Farhad Salmassi, Erik H. Anderson, and Eric M. Gullikson  »View Author Affiliations

Applied Optics, Vol. 43, Issue 28, pp. 5323-5329 (2004)

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As the development of extreme-ultraviolet (EUV) lithography progresses, interest grows in the extension of traditional optical components to the EUV regime. Because of the strong absorption of EUV by most materials and because of its extremely short wavelength, however, it is difficult to implement many components that are commonplace in the longer-wavelength regimes. One such example is the diffuser that is often implemented with ordinary ground glass in the visible light regime. Here we demonstrate the fabrication of reflective EUV diffusers with high efficiency within a controllable bandwidth. Using these techniques, we have fabricated diffusers with efficiencies exceeding 10% within a moderate angular single-sided bandwidth of approximately 0.06 rad.

© 2004 Optical Society of America

OCIS Codes
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.1980) Optical devices : Diffusers
(230.4000) Optical devices : Microstructure fabrication
(260.7200) Physical optics : Ultraviolet, extreme
(290.5880) Scattering : Scattering, rough surfaces
(340.6720) X-ray optics : Synchrotron radiation

Original Manuscript: February 28, 2004
Revised Manuscript: June 14, 2004
Published: October 1, 2004

Patrick P. Naulleau, J. Alexander Liddle, Farhad Salmassi, Erik H. Anderson, and Eric M. Gullikson, "Design, fabrication, and characterization of high-efficiency extreme-ultraviolet diffusers," Appl. Opt. 43, 5323-5329 (2004)

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