Many modern compact soft-x-ray and extreme-ultraviolet (EUV) imaging systems operate with small fields of view and therefore benefit from the use of small high-brightness sources. Such systems include water-window microscopes and EUV lithography tools. We show that the photon losses in such systems can be minimized while uniformity of object-plane illumination is maintained by controlled scanning of the source. The improved collection efficiency is demonstrated both theoretically and experimentally for a scanned laser-plasma source compared with static sources. A prospective aerial image microscope and a liquid-xenon-jet laser-plasma source are offered as examples of modern imaging tools that may benefit from such scanning of the source.
© 2004 Optical Society of America
Björn A. M. Hansson, Sofia Mosesson, and Hans M. Hertz, "Improved Emission Uniformity from a Liquid-Jet Laser-Plasma Extreme-Ultraviolet Source," Appl. Opt. 43, 5452-5457 (2004)