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Applied Optics

Applied Optics


  • Vol. 43, Iss. 29 — Oct. 10, 2004
  • pp: 5452–5457

Improved emission uniformity from a liquid-jet laser-plasma extreme-ultraviolet source

Björn A. M. Hansson, Sofia Mosesson, and Hans M. Hertz  »View Author Affiliations

Applied Optics, Vol. 43, Issue 29, pp. 5452-5457 (2004)

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Many modern compact soft-x-ray and extreme-ultraviolet (EUV) imaging systems operate with small fields of view and therefore benefit from the use of small high-brightness sources. Such systems include water-window microscopes and EUV lithography tools. We show that the photon losses in such systems can be minimized while uniformity of object-plane illumination is maintained by controlled scanning of the source. The improved collection efficiency is demonstrated both theoretically and experimentally for a scanned laser-plasma source compared with static sources. A prospective aerial image microscope and a liquid-xenon-jet laser-plasma source are offered as examples of modern imaging tools that may benefit from such scanning of the source.

© 2004 Optical Society of America

OCIS Codes
(110.3960) Imaging systems : Microlithography
(340.7440) X-ray optics : X-ray imaging
(340.7460) X-ray optics : X-ray microscopy

Original Manuscript: November 18, 2003
Revised Manuscript: June 28, 2004
Published: October 10, 2004

Björn A. M. Hansson, Sofia Mosesson, and Hans M. Hertz, "Improved emission uniformity from a liquid-jet laser-plasma extreme-ultraviolet source," Appl. Opt. 43, 5452-5457 (2004)

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