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Applied Optics

Applied Optics


  • Vol. 43, Iss. 32 — Nov. 10, 2004
  • pp: 5963–5970

Monitoring particle adsorption by use of laser reflectometry near the critical angle

Mary Carmen Peña-Gomar, Ma. Lourdes González-González, Augusto García-Valenzuela, Joan Antó-Roca, and Elías Pérez  »View Author Affiliations

Applied Optics, Vol. 43, Issue 32, pp. 5963-5970 (2004)

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We investigate the use of laser reflectometry near the critical angle to monitor particle adsorption onto a flat glass surface. Experimental results show that positive particles are adsorbed onto the glass surface and that their adsorption kinetics depend strongly on the volume fraction occupied by the particles in suspension but not appreciably on the particle size. The reflectance near the critical angle is dominated by the particles on the surface, with the contribution of the particles in suspension being very low. We compare the reflectance change near the critical angle with the change in reflectance near the Brewster angle when particles are adsorbed onto the glass surface. We find that reflectometry near the critical angle is 3000 times more sensitive than it is near the Brewster angle. Some optical images are presented to validate our results.

© 2004 Optical Society of America

OCIS Codes
(120.5700) Instrumentation, measurement, and metrology : Reflection
(240.0240) Optics at surfaces : Optics at surfaces
(260.6970) Physical optics : Total internal reflection
(290.0290) Scattering : Scattering
(350.4990) Other areas of optics : Particles

Original Manuscript: April 27, 2004
Revised Manuscript: August 20, 2004
Published: November 10, 2004

Mary Carmen Peña-Gomar, Ma. Lourdes González-González, Augusto García-Valenzuela, Joan Antó-Roca, and Elías Pérez, "Monitoring particle adsorption by use of laser reflectometry near the critical angle," Appl. Opt. 43, 5963-5970 (2004)

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