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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 43, Iss. 36 — Dec. 20, 2004
  • pp: 6545–6556

Repairing amplitude defects in multilayer-coated extreme-ultraviolet lithography reticles by use of a focused ion beam

Anton Barty, Stefan Hau-Riege, Dan Stearns, Miles Clift, Paul Mirkarimi, Eric Gullikson, Henry Chapman, and Don Sweeney  »View Author Affiliations


Applied Optics, Vol. 43, Issue 36, pp. 6545-6556 (2004)
http://dx.doi.org/10.1364/AO.43.006545


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Abstract

We present a method for repairing defects near the top surfaces of multilayer coatings in general and specifically on extreme-ultraviolet lithography mask blanks. Milling away the defect and a surrounding region of the multilayer by use of a focused ion beam can repair both the reflectivity and the phase of the reflected light in the vicinity of such a defect. We describe the conditions under which the repaired region will not itself be a defect and experimentally demonstrate the feasibility of this multilayer repair technique. The results described are also applicable to understanding and controlling the optical effects of ion-induced multilayer erosion.

© 2004 Optical Society of America

OCIS Codes
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography
(160.4670) Materials : Optical materials
(220.3740) Optical design and fabrication : Lithography
(230.4170) Optical devices : Multilayers

History
Original Manuscript: March 16, 2004
Published: December 20, 2004

Citation
Anton Barty, Stefan Hau-Riege, Dan Stearns, Miles Clift, Paul Mirkarimi, Eric Gullikson, Henry Chapman, and Don Sweeney, "Repairing amplitude defects in multilayer-coated extreme-ultraviolet lithography reticles by use of a focused ion beam," Appl. Opt. 43, 6545-6556 (2004)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-43-36-6545

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