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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 43, Iss. 5 — Feb. 10, 2004
  • pp: 1082–1090

Mo/B4C/Si multilayer-coated photodiode with polarization sensitivity at an extreme-ultraviolet wavelength of 13.5 nm

Benjawan Kjornrattanawanich, Saša Bajt, and John F. Seely  »View Author Affiliations


Applied Optics, Vol. 43, Issue 5, pp. 1082-1090 (2004)
http://dx.doi.org/10.1364/AO.43.001082


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Abstract

A silicon photodiode coated with an interface-engineered Mo/Si multilayer was developed as a polarization sensitive detector. The Mo/B4C/Si multilayer was designed to reflect 13.5-nm extreme-ultraviolet (EUV) radiation at an incident angle of 45°, at which the maximum polarization sensitivity occurs. The sensitivity of this specially coated photodiode and its polarization responses were determined by measurement of the reflectance and transmittance of the multilayer coating with synchrotron radiation. The Mo/B4C/Si multilayer was found to reflect 69.9% of the s-polarized radiation and only 2.4% of the p-polarized radiation, thus transmitting approximately 0.2% s-polarized radiation and 8.4% p-polarized radiation at a 13.5-nm wavelength and a 45° angle of incidence. A polarization ratio, (T p - T s )/(T p + T s ), of 95% was achieved with sufficiently high sensitivity from this photodiode. This result demonstrates the high polarization sensitivity and the usefulness of multilayer-coated photodiodes as novel EUV polarimeters.

© 2004 Optical Society of America

OCIS Codes
(230.4170) Optical devices : Multilayers
(230.5170) Optical devices : Photodiodes
(230.5440) Optical devices : Polarization-selective devices
(260.5430) Physical optics : Polarization
(260.7200) Physical optics : Ultraviolet, extreme

History
Original Manuscript: August 2, 2003
Revised Manuscript: October 8, 2003
Published: February 10, 2004

Citation
Benjawan Kjornrattanawanich, Saša Bajt, and John F. Seely, "Mo/B4C/Si multilayer-coated photodiode with polarization sensitivity at an extreme-ultraviolet wavelength of 13.5 nm," Appl. Opt. 43, 1082-1090 (2004)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-43-5-1082


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