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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 43, Iss. 6 — Feb. 20, 2004
  • pp: 1281–1285

Room-Temperature Deposition of Amorphous Titanium Dioxide Thin Film with High Refractive Index by a Filtered Cathodic Vacuum Arc Technique

Zhiwei Zhao, Beng Kang Tay, and Guoqing Yu  »View Author Affiliations


Applied Optics, Vol. 43, Issue 6, pp. 1281-1285 (2004)
http://dx.doi.org/10.1364/AO.43.001281


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Abstract

Amorphous titanium dioxide (TiO2) thin film has been prepared by a filtered cathodic vacuum arc technique at room temperature. It was concluded from the core level of Ti 2p3/2 (458.3 eV) and O 1s (529.9 eV) and their deviation in binding energy (ΔBE = 71.6 eV) that only one of Ti oxidation states, Ti4+, existed in the film and the film was of ideal stoichiometry. The film possessed high transmittance, which can reach as high as that of a quartz substrate, especially in the visible range, owing to its optical bandgap of 3.2 eV. The high refractive index (2.56 at 550 nm) and low extinction coefficient (~10−4 at 550 nm) suggested that the film had a high packing density and a low scattering-center concentration. These good optical properties implied the film prepared by this technique was a promising candidate for optical application. Besides, the film was found to transform in the structure from amorphous to anatase crystalline when it was annealed at 300 °C, as evidenced by Raman and x-ray diffraction.

© 2004 Optical Society of America

OCIS Codes
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties

Citation
Zhiwei Zhao, Beng Kang Tay, and Guoqing Yu, "Room-Temperature Deposition of Amorphous Titanium Dioxide Thin Film with High Refractive Index by a Filtered Cathodic Vacuum Arc Technique," Appl. Opt. 43, 1281-1285 (2004)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-43-6-1281


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