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Applied Optics

Applied Optics


  • Vol. 43, Iss. 9 — Mar. 19, 2004
  • pp: 1835–1848

Experimental comparison of extreme-ultraviolet multilayers for solar physics

David L. Windt, Soizik Donguy, John Seely, and Benjawan Kjornrattanawanich  »View Author Affiliations

Applied Optics, Vol. 43, Issue 9, pp. 1835-1848 (2004)

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We compare the reflectance and stability of multilayers comprising either Si/Mo, Si/Mo2C, Si/B4C, Si/C, or Si/SiC bilayers, designed for use as extreme-ultraviolet (EUV) reflective coatings. The films were deposited by using magnetron sputtering and characterized by both x-ray and EUV reflectometry. We find that the new Si/SiC multilayer offers the greatest spectral selectivity at the longer wavelengths, as well as the greatest thermal stability. We also describe the optimization of multilayers designed for the Solar-B EIS instrument. Finally, we compare experimental reflectance data with calculations and conclude that currently available optical constants cannot be used to adequately model the performance of many of these multilayers.

© 2004 Optical Society of America

OCIS Codes
(230.4170) Optical devices : Multilayers
(310.1620) Thin films : Interference coatings
(310.6860) Thin films : Thin films, optical properties
(340.0340) X-ray optics : X-ray optics
(350.1260) Other areas of optics : Astronomical optics

Original Manuscript: June 26, 2003
Published: March 20, 2004

David L. Windt, Soizik Donguy, John Seely, and Benjawan Kjornrattanawanich, "Experimental comparison of extreme-ultraviolet multilayers for solar physics," Appl. Opt. 43, 1835-1848 (2004)

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