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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 44, Iss. 12 — Apr. 20, 2005
  • pp: 2377–2381

Form-birefringence structure fabrication in GaAs by use of SU-8 as a dry-etching mask

Lin Pang, Maziar Nezhad, Uriel Levy, Chia-Ho Tsai, and Yeshaiahu Fainman  »View Author Affiliations


Applied Optics, Vol. 44, Issue 12, pp. 2377-2381 (2005)
http://dx.doi.org/10.1364/AO.44.002377


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Abstract

A thin layer of a SU-8 submicrometer pattern produced by holographic lithography was directly used as the dry-etching mask in a chemically assisted ion-beam-etching system. With optimized etching parameters, etching selectivity of 7:1 was achieved together with a smooth vertical profile. As an application, a half-wavelength retardation plate for a 1.55-µm wavelength was produced and evaluated.

© 2005 Optical Society of America

OCIS Codes
(090.0090) Holography : Holography
(230.3990) Optical devices : Micro-optical devices
(230.4000) Optical devices : Microstructure fabrication
(230.5440) Optical devices : Polarization-selective devices

History
Original Manuscript: April 15, 2004
Revised Manuscript: September 30, 2004
Manuscript Accepted: October 6, 2004
Published: April 20, 2005

Citation
Lin Pang, Maziar Nezhad, Uriel Levy, Chia-Ho Tsai, and Yeshaiahu Fainman, "Form-birefringence structure fabrication in GaAs by use of SU-8 as a dry-etching mask," Appl. Opt. 44, 2377-2381 (2005)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-44-12-2377

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