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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 44, Iss. 18 — Jun. 20, 2005
  • pp: 3769–3773

Multilayer optical thin films for use at terahertz frequencies: method of fabrication

Iwao Hosako  »View Author Affiliations


Applied Optics, Vol. 44, Issue 18, pp. 3769-3773 (2005)
http://dx.doi.org/10.1364/AO.44.003769


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Abstract

A new method of fabricating multilayer optical coatings used at terahertz frequencies has been developed. Using plasma-enhanced chemical-vapor deposition, a multilayer antireflection coating for germanium optics at terahertz frequencies was fabricated. The coating consists of amorphous silicon and silicon-oxide layers. The transmittance and structure of the coating were experimentally investigated. The transmittance spectrum of the coating on the Ge substrate shows a wideband antireflection behavior in the 40–120 cm−1 region.

© 2005 Optical Society of America

OCIS Codes
(260.3090) Physical optics : Infrared, far
(310.1210) Thin films : Antireflection coatings
(350.7420) Other areas of optics : Waves

History
Original Manuscript: March 22, 2004
Revised Manuscript: December 20, 2004
Manuscript Accepted: January 20, 2005
Published: June 20, 2005

Citation
Iwao Hosako, "Multilayer optical thin films for use at terahertz frequencies: method of fabrication," Appl. Opt. 44, 3769-3773 (2005)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-44-18-3769

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