OSA's Digital Library

Applied Optics

Applied Optics


  • Vol. 44, Iss. 21 — Jul. 20, 2005
  • pp: 4429–4434

Optimized condition for etching fused-silica phase gratings with inductively coupled plasma technology

Shunquan Wang, Changhe Zhou, Huayi Ru, and Yanyan Zhang  »View Author Affiliations

Applied Optics, Vol. 44, Issue 21, pp. 4429-4434 (2005)

View Full Text Article

Enhanced HTML    Acrobat PDF (538 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



Polymer deposition is a serious problem associated with the etching of fused silica by use of inductively coupled plasma (ICP) technology, and it usually prevents further etching. We report an optimized etching condition under which no polymer deposition will occur for etching fused silica with ICP technology. Under the optimized etching condition, surfaces of the fabricated fused silica gratings are smooth and clean. Etch rate of fused silica is relatively high, and it demonstrates a linear relation between etched depth and working time. Results of the diffraction of gratings fabricated under the optimized etching condition match theoretical results well.

© 2005 Optical Society of America

OCIS Codes
(050.1380) Diffraction and gratings : Binary optics
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.1950) Optical devices : Diffraction gratings

Original Manuscript: September 16, 2004
Revised Manuscript: February 27, 2005
Manuscript Accepted: March 7, 2005
Published: July 20, 2005

Shunquan Wang, Changhe Zhou, Huayi Ru, and Yanyan Zhang, "Optimized condition for etching fused-silica phase gratings with inductively coupled plasma technology," Appl. Opt. 44, 4429-4434 (2005)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. J. Turunen, F. Wyrowski, Diffractive Optics for Industrial and Commercial Applications (Akademie Verlag, 1997).
  2. A. G. Lopez, H. G. Craighead, “Subwavelength surface-relief gratings fabricated by microcontact printing of self-assembled monolayers,” Appl. Opt. 40, 2068–2075 (2001). [CrossRef]
  3. J. N. Mait, A. Scherer, O. Dial, D. W. Prather, X. Gao, “Diffractive lens fabricated with binary features less than 60 nm,” Opt. Lett. 25, 381–383 (2000). [CrossRef]
  4. P. B. Mirkarimi, S. L. Baker, C. Montcalm, J. A. Folta, “Recovery of multilayer-coated Zerodur and ULE optics for extreme-ultraviolet lithography by recoating, reactive-ion etching, and wet-chemical processes,” Appl. Opt. 40, 62–70 (2001). [CrossRef]
  5. T. Clausnitzer, J. Limpert, K. Zöllner, H. Zellmer, H. J. Fuchs, E. B. Kley, A. Tünnermann, M. Jup, D. Ristau, “Highly efficient transmission gratings in fused silica for chirped-pulse amplification systems,” Appl. Opt. 42, 6934–6938 (2003). [CrossRef] [PubMed]
  6. C. Zhou, L. Liu, “Numerical study of Dammann array illuminator,” Appl. Opt. 34, 5961–5969 (1995). [CrossRef] [PubMed]
  7. E. M. Strzelecka, G. D. Robinson, L. A. Coldren, “Fabrication of refractive microlenses in semiconductors by mask shape transfer in reactive ion etching,” Microelectron. Eng. 35, 385–388 (1997). [CrossRef]
  8. H. Sankur, R. Hall, E. Motamedi, “Fabrication of microlens arrays by reactive ion milling,” in Miniaturized Systems with Micro-Optics and Micromechanics,M. E. Motamedi, ed., Proc. SPIE2687, 150–155 (1996). [CrossRef]
  9. Y. Fu, N. K. A. Bryan, “Hybrid microdiffractive-microrefractive lens with a continuous relief fabricated by focused-ion-beam milling for single-mode fiber coupling,” Appl. Opt. 40, 5872–5876 (2001). [CrossRef]
  10. C. Zhou, P. Xi, S. Zhao, “Phase gratings made with inductively coupled plasma technology,” in Photonic Devices and Algorithms for Computing III,K. M. Iftekharuddin, A. A. S. Awwal, eds., Proc. SPIE4470, 138–145 (2001). [CrossRef]
  11. M. Karlsson, F. Nikolajeff, “Transfer of micro-optical structures into GaAs by use of inductively coupled plasma dry etching,” Appl. Opt. 41, 902–908 (2000). [CrossRef]
  12. S. T. Jung, H. S. Song, H. S. Kim, “Inductively coupled plasma etching of SiO2 layers for planar lightwave circuits,” Thin Solid Films, 341, 188–191 (1999). [CrossRef]
  13. R. J. Shul, G. B. McClellan, “Role of steady state fluorocarbon films in etching of silicon dioxide using CHF3 in an inductively coupled plasma reactor,” J. Vac. Sci. Technol. A 15, 1881–1889 (1997). [CrossRef]
  14. E. Gogolides, P. Vauvert, “Etching of SiO2 and Si in fluorocarbon plasma: a detailed surface model accounting for etching and deposition,” J. Appl. Phys. 88, 5570–5584 (2000). [CrossRef]
  15. H. Doh, Y. Horiike, “Gas resident time effects on plasma parameters: comparison between Ar and C4F8,” Jpn. J. Appl. Phys. 40, 3419–3426 (2001). [CrossRef]
  16. M. Karlsson, F. Nikolajeff, “Transfer of micro-optical structures into GaAs by use of inductively coupled plasma dry etching,” Appl. Opt. 41, 902–908 (2002). [CrossRef] [PubMed]
  17. S. H. Park, H. Jeon, Y. J. Sung, G. Y. Yeom, “Refractive sapphire microlenses fabricated by chlorine-based inductively coupled plasma etching,” Appl. Opt. 40, 3698–3702 (2001). [CrossRef]
  18. P. Xi, C. Zhou, E. Dai, L. Liu, “Generation of near-field hexagonal array illumination with a phase grating,” Opt. Lett. 27, 228–230 (2002). [CrossRef]
  19. E. Dai, C. Zhou, P. Xi, L. Liu, “Multifunctional double-layered diffractive optical element,” Opt. Lett. 28, 1513–1515 (2003). [CrossRef] [PubMed]
  20. C. Zhou, J. Jia, L. Liu, “Circular Dammann grating,” Opt. Lett. 28, 2174–2176 (2003). [CrossRef] [PubMed]
  21. J. Jia, C. Zhou, X. Sun, L. Liu, “Superresolution laser beam shaping,” Appl. Opt. 43, 2112–2117 (2004). [CrossRef] [PubMed]
  22. C. J. Choi, O. S. Kwon, “Ar addition effect on mechanism of fluorocarbon ion formation in CF4/Ar inductively coupled plasma,” J. Vac. Sci. Technol. B 18, 811–819 (2000). [CrossRef]
  23. M. G. Moharam, D. A. Pommet, E. B. Grann, T. K. Gaylord, “Stable implementation of the rigorous coupled-wave analysis for surface-relief dielectric gratings: enhanced transmittance matrix approach,” J. Opt. Soc. Am. A 12, 1077–1086 (1995). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited