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Applied Optics

Applied Optics


  • Vol. 44, Iss. 21 — Jul. 20, 2005
  • pp: 4494–4500

Measurement of duty cycles of photoresist grating masks made on top of multilayer dielectric stacks

Lifeng Li and Lijiang Zeng  »View Author Affiliations

Applied Optics, Vol. 44, Issue 21, pp. 4494-4500 (2005)

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We present a novel and nondestructive method for measuring the duty cycles (ratio of ridge width to period) of submicrometer rectangular photoresist gratings made on top of multilayer dielectric stacks. The method exploits the fact that the effective index of the leaky mode that has a strong evanescent tail in the cladding changes with the duty cycle of the grating situated at the interface between the top dielectric layer and the cladding. By comparing measured coupling angles of the leaky mode with a theoretical or experimentally calibrated relationship between coupling angles and duty cycle, one can determine the duty cycle of the grating. This method is applicable even when the grating period is less than the measurement wavelength. It is simple because it does not require any power measurement. Most importantly, it is virtually independent of groove depth. The physical principle of the method and the results of experimental verification are presented.

© 2005 Optical Society of America

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.1950) Diffraction and gratings : Diffraction gratings
(050.2770) Diffraction and gratings : Gratings
(120.4290) Instrumentation, measurement, and metrology : Nondestructive testing
(120.6650) Instrumentation, measurement, and metrology : Surface measurements, figure
(310.2790) Thin films : Guided waves

Original Manuscript: December 8, 2004
Revised Manuscript: March 2, 2005
Manuscript Accepted: March 3, 2005
Published: July 20, 2005

Lifeng Li and Lijiang Zeng, "Measurement of duty cycles of photoresist grating masks made on top of multilayer dielectric stacks," Appl. Opt. 44, 4494-4500 (2005)

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  1. M. D. Perry, R. D. Boyd, J. A. Britten, D. Decker, B. W. Shore, C. Shannon, E. Shults, L. Li, “High-efficiency multilayer dielectric diffraction gratings,” Opt. Lett. 20, 940–942 (1995); erratum 20, 1513 (1995). [CrossRef] [PubMed]
  2. B. W. Shore, M. D. Perry, J. A. Britten, R. D. Boyd, M. D. Feit, H. Nguyen, R. Chow, G. Loomis, L. Li, “Design of high efficiency dielectric reflection gratings,” J. Opt. Soc. Am. A 14, 1124–1136 (1997). [CrossRef]
  3. K. Hehl, J. Bischoff, U. Mohaupt, M. Palme, B. Schnabel, L. Wenke, R. Bödefeld, W. Theobald, E. Welsch, R. Sauerbrey, H. Heyer, “High-efficiency dielectric reflection gratings: design, fabrication, and analysis,” Appl. Opt. 38, 6257–6271 (1999). [CrossRef]
  4. M. Breidne, D. Maystre, “Equivalence of ruled, holographic, and lamellar gratings in constant deviation mountings,” Appl. Opt. 19, 1812–1820 (1980). [CrossRef] [PubMed]
  5. C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, J. R. McNeil, “Metrology of subwavelength photoresist gratings using optical scatterometry,” J. Vac. Sci. Technol. B 13, 1484–1495 (1995). [CrossRef]
  6. C. J. Raymond, M. R. Murnane, S. L. Prins, S. S. H. Naqvi, J. R. McNeil, J. W. Hosch, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. B 15, 361–368 (1997). [CrossRef]
  7. E. M. Drège, J. A. Reed, D. M. Byrne, “Linearized inversion of scatterometric data to obtain surface profile information,” Opt. Eng. 41, 225–236 (2002). [CrossRef]
  8. H.-T. Huang, F. L. Terry, “Spectroscopic ellipsometry and reflectometry from gratings (scatterometry) for critical dimension measurement and in situ, real-time process monitoring,” Thin Solid Films 455–456, 828–836 (2004). [CrossRef]
  9. J. R. Marciante, N. O. Farmiga, J. I. Hirsh, M. S. Evans, H. T. Ta, “Optical measurement of depth and duty cycle for binary diffraction gratings with subwavelength features,” Appl. Opt. 42, 3234–3240 (2003). [CrossRef] [PubMed]
  10. L. Li, “Determination of bound modes of multilayer planar waveguides by integration of an initial-value problem,” J. Opt. Soc. Am. A 11, 984–991 (1994). [CrossRef]
  11. T. Tamir, “Inhomogeneous wave types at planar interfaces. III. Leaky waves,” Optik 38, 269–297 (1973).
  12. T. Tamir, “Leaky waves in planar optical waveguides,” Nouv. Rev. Opt. 6, 273–284 (1975). [CrossRef]
  13. T. Tamir, F. Y. Kou, “Varieties of leaky waves and their excitation along multilayered structures,” IEEE J. Quantum Electron. 22, 544–551 (1986). [CrossRef]
  14. T. Tamir, S. Zhang, “Resonant scattering by multilayered dielectric gratings,” J. Opt. Soc. Am. A 14, 1607–1616 (1997). [CrossRef]
  15. M. Nevière, “The homogeneous problem,” in Electromagnetic Theory of Gratings,R. Petit, ed. (Springer-Verlag, 1980), pp. 123–157. [CrossRef]
  16. A. Hessel, A. A. Oliner, “A new theory of Wood’s anomaly on optical gratings,” Appl. Opt. 4, 1275–1297 (1965). [CrossRef]

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