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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 44, Iss. 21 — Jul. 20, 2005
  • pp: 4569–4573

Threshold effects for resistance to optical damage and nonvolatile holographic storage properties in In:Mn:Fe:LiNbO3 crystals

Xihe Zhen, Qiang Li, and Yuheng Xu  »View Author Affiliations


Applied Optics, Vol. 44, Issue 21, pp. 4569-4573 (2005)
http://dx.doi.org/10.1364/AO.44.004569


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Abstract

The threshold concentration for In2O3 was found in In:Mn:Fe:LiNbO3 crystals by measurement of the infrared spectra of the crystals. The resistance of the In:Mn:Fe:LiNbO3 crystals to optical damage is characterized by changes in photoinduced birefringence as well as by distortion of the transmitted beam pattern. The resistance increases remarkably when the concentration of In2O3 exceeds its threshold. The resistance to optical damage of a In(3.0 mol. %):Mn:Fe:LiNbO3 crystal is 2 orders of magnitude higher that of a Mn:Fe:LiNbO3 crystal. The dependence of defects on the resistance to optical damage of the In:Mn:Fe:LiNbO3 crystals is discussed in detail. Nonvolatile holographic storage was achieved for all crystals, and the sensitivity of the In(3.0 mol. %):Mn:Fe:LiNbO3 crystal is much higher than that of the others.

© 2005 Optical Society of America

OCIS Codes
(160.3730) Materials : Lithium niobate
(190.5330) Nonlinear optics : Photorefractive optics
(300.1030) Spectroscopy : Absorption
(300.6540) Spectroscopy : Spectroscopy, ultraviolet
(350.1820) Other areas of optics : Damage

History
Original Manuscript: September 30, 2004
Revised Manuscript: February 28, 2005
Manuscript Accepted: March 4, 2005
Published: July 20, 2005

Citation
Xihe Zhen, Qiang Li, and Yuheng Xu, "Threshold effects for resistance to optical damage and nonvolatile holographic storage properties in In:Mn:Fe:LiNbO3 crystals," Appl. Opt. 44, 4569-4573 (2005)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-44-21-4569

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