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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Glenn D. Boreman
  • Vol. 44, Iss. 28 — Oct. 1, 2005
  • pp: 5884–5893

Correcting for stage error motions in radius measurements

Angela Davies and Tony L. Schmitz  »View Author Affiliations


Applied Optics, Vol. 44, Issue 28, pp. 5884-5893 (2005)
http://dx.doi.org/10.1364/AO.44.005884


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Abstract

Traceable radius of curvature measurements are critical for precision optics manufacturing. An optical bench measurement is repeatable and is the preferred method for low-uncertainty applications. With an optical bench, the displacement of the optic is measured as it is moved between the cat/s eye and the confocal positions, each identified using a figure measuring interferometer. The translated distance is nominally the radius of curvature; however, errors in the motion of the stage add a bias to the measurement, even if the error motions are zero on average. Estimating the bias and resulting measurement uncertainty is challenging. We have developed a new mathematical definition of the radius measurand that intrinsically corrects for error motion biases and also provides a means of representing other terms such as figure error correction, wave-front aberration biases, displacement gauge calibration and their uncertainties. With this formalism, it is no long necessary to design a high-quality radius bench to carry out a precision measurement; rather a lower quality is adequate, provided that error motions are repeatable and characterized and error motion measurement uncertainties are estimated.

© 2005 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.6650) Instrumentation, measurement, and metrology : Surface measurements, figure
(220.4840) Optical design and fabrication : Testing

ToC Category:
Instrumentation, Measurement, and Metrology

Citation
Angela Davies and Tony L. Schmitz, "Correcting for stage error motions in radius measurements," Appl. Opt. 44, 5884-5893 (2005)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-44-28-5884


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References

  1. Sponsored by R. Plympton, Optimax Systems, Inc., Ontario, N.Y.
  2. D. Malacara, Optical Shop Testing (Wiley, 1992).
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  12. D. Karodkar, N. Gardner, B. Bergner, and A. Davies, "Traceable radius of curvature measurements on a micro-interferometer," in Optical Manufacturing and Testing IV, H. P. Stahl, ed. Proc. SPIE 5180, 261-273 (2003). [CrossRef]

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