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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Glenn D. Boreman
  • Vol. 44, Iss. 28 — Oct. 1, 2005
  • pp: 5899–5904

Accurate polarization measurements with a dual photoelastic modulator

Mattias Kuldkepp, Nick C. Hawkes, Elisabeth Rachlew, and Beatrix Schunke  »View Author Affiliations


Applied Optics, Vol. 44, Issue 28, pp. 5899-5904 (2005)
http://dx.doi.org/10.1364/AO.44.005899


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Abstract

Measurements of the polarization effects in multimirror experiments by using a dual photoelastic modulator are described. The effect of single and multiple mirrors in polarization measurements in two and three dimensions is discussed, and experimental results show how symmetrical placement of mirrors in three-dimensional geometry can eliminate changes in the polarization. Calibration procedures for a dual photoelastic modulator and potential error sources such as misalignment of analyzer, signal dc offset, and neglect of aperture size are presented. Mirror-surface evolution and how it can disturb the polarization measurement are also addressed.

© 2005 Optical Society of America

OCIS Codes
(120.5410) Instrumentation, measurement, and metrology : Polarimetry
(240.0240) Optics at surfaces : Optics at surfaces

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: January 7, 2005
Revised Manuscript: April 15, 2005
Manuscript Accepted: April 20, 2005
Published: October 1, 2005

Citation
Mattias Kuldkepp, Nick C. Hawkes, Elisabeth Rachlew, and Beatrix Schunke, "Accurate polarization measurements with a dual photoelastic modulator," Appl. Opt. 44, 5899-5904 (2005)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-44-28-5899


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