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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Glenn D. Boreman
  • Vol. 44, Iss. 28 — Oct. 1, 2005
  • pp: 5910–5918

Thickness measurements on transparent substrates based on reflection ellipsometry. I. Optical effects of high-refractive-index additional layers

Soichi Otsuki, Koji Ohta, Kaoru Tamada, and Shin-ichi Wakida  »View Author Affiliations


Applied Optics, Vol. 44, Issue 28, pp. 5910-5918 (2005)
http://dx.doi.org/10.1364/AO.44.005910


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Abstract

Theoretical studies were conducted for thickness measurements using transparent substrates on the external and internal reflection configurations. For three-phase systems consisting of ambient, film, and substrate, the refractive index of the substrate could be optimized to obtain the high sensitivity of an ellipsometric quantity Δ to the film thickness and the small susceptibility of Δ to errors in the incident angle. It was shown that the combination of an ordinary glass substrate and an additional dielectric layer with an appropriate layer thickness works as a synthetic high-index single substrate (SHIS). The optical effect of the combination was approximately described by use of the effective refractive index of SHIS. A method to select the refractive index of the additional layer was also given.

© 2005 Optical Society of America

OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(240.6700) Optics at surfaces : Surfaces
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Ellipsometry and Polarimetry

History
Original Manuscript: May 14, 2004
Revised Manuscript: March 7, 2005
Manuscript Accepted: April 29, 2005
Published: October 1, 2005

Citation
Soichi Otsuki, Koji Ohta, Kaoru Tamada, and Shin-ichi Wakida, "Thickness measurements on transparent substrates based on reflection ellipsometry. I. Optical effects of high-refractive-index additional layers," Appl. Opt. 44, 5910-5918 (2005)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-44-28-5910

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