OSA's Digital Library

Applied Optics

Applied Optics


  • Editor: Glenn D. Boreman
  • Vol. 44, Iss. 29 — Oct. 10, 2005
  • pp: 6176–6180

Ion-assisted sputtering deposition of antireflection film coating for flexible liquid-crystal display applications

Jyh-Jier Ho, Chin-Ying Chen, Chao-Ming Huang, William J. Lee, Wan-Rone Liou, and Chung-Chang Chang  »View Author Affiliations

Applied Optics, Vol. 44, Issue 29, pp. 6176-6180 (2005)

View Full Text Article

Enhanced HTML    Acrobat PDF (1162 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



The optical properties and surface morphologies of sputtering films both without and with use of the ion-assisted deposition (IAD) technique are investigated and compared. Optimal antireflection (AR) coating films with SiO2/Nb2O5 layers, which are grown at 80 °C with a 15 cm distance between target and substrate, 55 SCCM oxygen flow (SCCM denotes cubic centimeters per minute at STP), and 1250 W magnetron sputtering power with use of the IAD technique, are used to study the optical performance. By using an atomic force microscope to investigate the surface of the sputtered Nb2O5 films, we find that the films’ roughness is 0.185 nm. On a flexible hardness polycarbonate (HPC) substrate with the multilayer AR films, the peak transmittances measured in the visible range are 95.89% and 93.40%, respectively, for coatings with and without use of the IAD sputtering technology. These results are better than those measured with a bare HPC substrate (91.25%) and are well above the commercial liquid-crystal display standard (90%) and flexible application.

© 2005 Optical Society of America

OCIS Codes
(250.0250) Optoelectronics : Optoelectronics
(310.1210) Thin films : Antireflection coatings

ToC Category:
Thin Films

Original Manuscript: November 23, 2004
Revised Manuscript: May 10, 2005
Manuscript Accepted: May 16, 2005
Published: October 10, 2005

Jyh-Jier Ho, Chin-Ying Chen, Chao-Ming Huang, William J. Lee, Wan-Rone Liou, and Chung-Chang Chang, "Ion-assisted sputtering deposition of antireflection film coating for flexible liquid-crystal display applications," Appl. Opt. 44, 6176-6180 (2005)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. Y. Martynov, H. Konijin, N. Pfeffer, S. Kuppens, W. Timmers, “High-efficiency slim LED backlight system with mixing light guide,” SID Int. Symp. Digest Tech. Papers 34, 1259–1261 (2003). [CrossRef]
  2. S. V. Belayev, M. Schadt, M. I. Barnik, J. Fünfschilling, N. V. Malimoneko, K. Schmitt, “Large aperture polarized light source and novel liquid crystal display operating modes,” Jpn. J. Appl. Phys. 29, L634–L637 (1990). [CrossRef]
  3. H. A. Macleod, Thin Film Optical Filters,3rd ed. (Institute of Physics, 2001). [CrossRef]
  4. P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Sainty, “Ion-beam-assisted deposition of thin films,” Appl. Opt. 22, 178–184 (1983). [CrossRef] [PubMed]
  5. J. D. Targove, J. P. Lehan, L. J. Lingg, H. A. Macleod, J. Leavitt, L. C. McIntyre, “Ion-assisted deposition of lanthanum fluoride thin films,” Appl. Opt. 26, 3733–3738 (1987). [CrossRef] [PubMed]
  6. D. A. Glocker, “Influence of the plasma on substrate heating during low-frequency reactive sputtering of AIN,” J. Vac. Sci. Technol. A 11, 2989–2993 (1993). [CrossRef]
  7. D. T. Wei, H. R. Kaufman, C. C. Lee, Thin Films for Optical Systems, F. R. Flory, ed. (Marcel Dekker, 1995), Chap. 6.
  8. C.-C. Lee, C.-L. Tien, J.-C. Hsu, “Internal stress and optical properties of Nb2O5 thin films deposited by ion-beam sputtering,” Appl. Opt. 41, 2043–2047 (2002). [CrossRef] [PubMed]
  9. J.-C. Hsu, C.-C. Lee, “Single- and dual-ion-beam sputter deposition of titanium oxide films,” Appl. Opt. 37, 1171–1176 (1998). [CrossRef]
  10. J. R. McNeil, A. C. Barron, S. R. Wilson, W. C. Herrmann, “Ion-assisted deposition of optical thin films: low-energy vs. high-energy bombardment,” Appl. Opt. 23, 552–556 (1984). [CrossRef]
  11. F. A. Smidt, “Use of ion beam assisted deposition to modify the microstructure and properties of thin films,” Int. Mater. Rev. 35, 61–66 (1990). [CrossRef]
  12. J.-J. Ho, C. Y. Chen, “Power effects in indium zinc oxide thin films for organic light-emitting devices on flexible applications,” J. Electrochem. Soc. 152, G57–G61 (2005). [CrossRef]
  13. G. Odian, Principles of Polymerization, 2nd ed. (Wiley-Interscience, 1981).

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited