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Applied Optics

Applied Optics


  • Vol. 44, Iss. 3 — Jan. 20, 2005
  • pp: 378–383

Titania, silicon dioxide, and tantalum pentoxide waveguides and optical resonant filters prepared with radio-frequency magnetron sputtering and annealing

Rabi Rabady and Ivan Avrutsky  »View Author Affiliations

Applied Optics, Vol. 44, Issue 3, pp. 378-383 (2005)

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Mixing dielectric materials in solid-thin-film deposition allows the engineering of thin films’ optical constants to meet specific thin-film-device requirements, which can be significantly useful for optoelectronics devices and photonics technologies in general. In principle, by use of radio-frequency (rf) magnetron sputtering, it would be possible to mix any two, or more, materials at different molar ratios as long as the mixed materials are not chemically reactive in the mixture. This freedom in material mixing by use of magnetron sputtering has an advantage by providing a wide range of the material optical constants, which eventually enables the photonic-device designer to have the flexibility to achieve optimal device performance. We deposited three combinations from three different oxides by using rf magnetron sputtering and later investigated them for their optical constants. Each two-oxide mixture was done at different molar ratio levels. Moreover, postdeposition annealing was investigated and was shown to reduce the optical losses and to stabilize the film composition against environmental effects such as aging and humidity exposure. These investigations were supported by the fabricated planar waveguides and optical resonant filters.

© 2005 Optical Society of America

OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(230.7390) Optical devices : Waveguides, planar
(310.6860) Thin films : Thin films, optical properties

Original Manuscript: September 4, 2003
Revised Manuscript: June 23, 2004
Manuscript Accepted: October 12, 2004
Published: January 20, 2005

Rabi Rabady and Ivan Avrutsky, "Titania, silicon dioxide, and tantalum pentoxide waveguides and optical resonant filters prepared with radio-frequency magnetron sputtering and annealing," Appl. Opt. 44, 378-383 (2005)

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  1. K. Okimura, A. Shibata, “Deposition of high quality TiO2 films by RF magnetron sputtering with an auxiliary permanent magnet,” Jpn. J. Appl. Phys. 36, 4917–4921 (1997). [CrossRef]
  2. C. Tosello, F. Rossi, S. Ronchin, R. Rolli, G. C. Righini, S. Pelli, E. Moser, M. Montagna, M. Ferrari, C. Duverger, “Erbium-activated silica–titania planar waveguides on silica-on-silicon substrates prepared by rf sputtering,” J. Non-Cryst. Solids 248, 230–236 (2001). [CrossRef]
  3. P. Alexandrov, J. Koprinarova, D. Todorov, “Dielectric properties of TiO2 reactivity sputtered from Ti in an RF magnetron,” Vacuum 47, 1333–1336 (1996). [CrossRef]
  4. T. Yamagauchi, H. Tamura, S. Taga, S. Tsuchiya, “Interfacial optical absorption in TiO2–SiO2 multilayer coatings prepared by rf magnetron sputtering,” Appl. Opt. 25, 2703–2706 (1986). [CrossRef]
  5. K. G. Geraghty, L. F. Donaghey, “Preparation of suboxides in the Ti-O system by reactive sputtering,” Thin Solid Films 40, 375–383 (1977). [CrossRef]
  6. E. N. Farabaugh, D. M. Sanders, “Microstructure of dielectric thin films formed by e-beam coevaporation,” J. Vac. Sci. Technol. A 1, 356–359 (1983). [CrossRef]
  7. B. J. Pond, J. I. DeBar, C. K. Carniglia, T. Raj, “Stress reduction in ion beam sputtered mixed oxide films,” Appl. Opt. 28, 2800–2805 (1989). [CrossRef] [PubMed]
  8. A. V. Osinsky, R. A. Bellman, I. A. Akwani, P. A. Sachenik, S. L. Logunov, J. W. McCamy, “Optical loss mechanisms in GeSiON planar waveguides,” Appl. Phys. Lett. 81, 2002–2004 (2002). [CrossRef]
  9. R. Rabady, I. Avrutsky, “Reliable fabrication technologies for optical resonant filters,” Appl. Opt. 42, 4499–4504 (2003). [CrossRef] [PubMed]
  10. R. Swanepoel, “Determination of the thickness and optical constants of amorphous silicon,” J. Phys. E 16, 1214–1222 (1983). [CrossRef]
  11. E. E. Khawaja, “The determination of the refractive index and thickness of a transparent film,” J. Phys. D 9, 1939–1943 (1971). [CrossRef]
  12. L. Ward, The Optical Constants of Bulk Material and Films, 2nd ed. (Institute of Physics, London, (1994).

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