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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 44, Iss. 3 — Jan. 20, 2005
  • pp: 378–383

Titania, silicon dioxide, and tantalum pentoxide waveguides and optical resonant filters prepared with radio-frequency magnetron sputtering and annealing

Rabi Rabady and Ivan Avrutsky  »View Author Affiliations


Applied Optics, Vol. 44, Issue 3, pp. 378-383 (2005)
http://dx.doi.org/10.1364/AO.44.000378


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Abstract

Mixing dielectric materials in solid-thin-film deposition allows the engineering of thin films' optical constants to meet specific thin-film-device requirements, which can be significantly useful for optoelectronics devices and photonics technologies in general. In principle, by use of radio-frequency (rf) magnetron sputtering, it would be possible to mix any two, or more, materials at different molar ratios as long as the mixed materials are not chemically reactive in the mixture. This freedom in material mixing by use of magnetron sputtering has an advantage by providing a wide range of the material optical constants, which eventually enables the photonic-device designer to have the flexibility to achieve optimal device performance. We deposited three combinations from three different oxides by using rf magnetron sputtering and later investigated them for their optical constants. Each two-oxide mixture was done at different molar ratio levels. Moreover, postdeposition annealing was investigated and was shown to reduce the optical losses and to stabilize the film composition against environmental effects such as aging and humidity exposure. These investigations were supported by the fabricated planar waveguides and optical resonant filters.

© 2005 Optical Society of America

OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(230.7390) Optical devices : Waveguides, planar
(310.6860) Thin films : Thin films, optical properties

Citation
Rabi Rabady and Ivan Avrutsky, "Titania, silicon dioxide, and tantalum pentoxide waveguides and optical resonant filters prepared with radio-frequency magnetron sputtering and annealing," Appl. Opt. 44, 378-383 (2005)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-44-3-378

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