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Applied Optics

Applied Optics


  • Editor: Glenn D. Boreman
  • Vol. 44, Iss. 34 — Dec. 1, 2005
  • pp: 7302–7306

Rapid subsurface detection of nanoscale defects in live microprocessors by functional infrared emission spectral microscopy

Caesar Saloma, Alvarado Tarun, Michelle Bailon, and Maricor Soriano  »View Author Affiliations

Applied Optics, Vol. 44, Issue 34, pp. 7302-7306 (2005)

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We demonstrate the rapid and nondestructive detection of subsurface nanometer-size defects in 90 nm technology live microprocessors with a new technique called functional infrared emission spectral microscopy. Broken, leaky, and good transistors with similar photoemission images are identified from each other by their different emission spectra that are calculated as linear combinations of weighted basis spectra. The basis spectra are derived from a spectral library by principal component analysis. Leaky transistors do not exhibit apparent morphological damage and are undetectable by optical or scanning probe microscopy alone. The emission signals from two or more transistors combined incoherently, and defect detection is primarily limited by the signal-to-noise ratio of the detected spectrum and not by the separation distance of neighboring transistors.

© 2005 Optical Society of America

OCIS Codes
(110.3080) Imaging systems : Infrared imaging
(120.4630) Instrumentation, measurement, and metrology : Optical inspection
(180.0180) Microscopy : Microscopy
(300.6340) Spectroscopy : Spectroscopy, infrared

ToC Category:

Original Manuscript: March 31, 2005
Revised Manuscript: June 10, 2005
Manuscript Accepted: June 19, 2005
Published: December 1, 2005

Caesar Saloma, Alvarado Tarun, Michelle Bailon, and Maricor Soriano, "Rapid subsurface detection of nanoscale defects in live microprocessors by functional infrared emission spectral microscopy," Appl. Opt. 44, 7302-7306 (2005)

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