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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 44, Iss. 4 — Feb. 1, 2005
  • pp: 506–511

Design and fabrication of diffractive optical elements by use of gray-scale photolithography

Jin-Seung Sohn, Myung-Bok Lee, Wan-Chin Kim, Eun-Hyung Cho, Tae-Wan Kim, Chan-Young Yoon, No-Cheol Park, and Young-Pil Park  »View Author Affiliations


Applied Optics, Vol. 44, Issue 4, pp. 506-511 (2005)
http://dx.doi.org/10.1364/AO.44.000506


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Abstract

Diffractive optical elements (DOEs) are key components in the miniaturization of optical systems because of their planarity and extreme thinness. We demonstrate the fabrication of DOEs by use of gray-scale photolithography with a high-energy-beam sensitive glass photomask. We obtained DOE lenses with continuous phase profiles as small as 800 μm in diameter and 5.9 μm in the outermost grating pitch by selecting a suitable optical density for each height level and optimizing the process variables. Microlenses patterned with eight levels and replicated by UV embossing with the polymer master mold showed a diffraction efficiency of 81.5%, which was sufficiently high for the devices to be used as optical pickups. The effects of deviations in diffraction efficiency between the DOE height and profile design were analyzed.

© 2005 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.4610) Optical design and fabrication : Optical fabrication

History
Original Manuscript: June 22, 2004
Revised Manuscript: October 4, 2004
Manuscript Accepted: October 14, 2004
Published: February 1, 2005

Citation
Jin-Seung Sohn, Myung-Bok Lee, Wan-Chin Kim, Eun-Hyung Cho, Tae-Wan Kim, Chan-Young Yoon, No-Cheol Park, and Young-Pil Park, "Design and fabrication of diffractive optical elements by use of gray-scale photolithography," Appl. Opt. 44, 506-511 (2005)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-44-4-506

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