A 3×3 micromirror array has been designed and successfully fabricated by multilayer silicon surface micromaching technology. It is composed of a bottom electrode, a supporting part, and a mirror plate and can modulate both phase and amplitude of incident light. The maximum deflection length along the vertical direction of the mirror plate is 2 µm, and the rotation angles about the Y and X axes are ±2.3° and ±1.45°, respectively; one can obtain an even larger deflection by simply increasing the thickness of the sacrificial layers.
© 2005 Optical Society of America
Hongbin Yu, Haiqing Chen, and Sai Fu, "Versatile micromirror with a multimovement mode," Appl. Opt. 44, 1178-1181 (2005)