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Applied Optics

Applied Optics


  • Vol. 44, Iss. 9 — Mar. 21, 2005
  • pp: 1559–1571

Multiple-wave lateral shearing interferometry for wave-front sensing

J.-C. Chanteloup  »View Author Affiliations

Applied Optics, Vol. 44, Issue 9, pp. 1559-1571 (2005)

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Multiple-wave achromatic interferometric techniques are used to measure, with high accuracy and high transverse resolution, wave fronts of polychromatic light sources. The wave fronts to be measured are replicated by a diffraction grating into several copies interfering together, leading to an interference pattern. A CCD detector located in the vicinity of the grating records this interference pattern. Some of these wave-front sensors are able to resolve wave-front spatial frequencies 3 to 4 times higher than a conventional Shack–Hartmann technique using an equivalent CCD detector. Its dynamic is also much higher, 2 to 3 orders of magnitude.

© 2005 Optical Society of America

Original Manuscript: April 2, 2004
Revised Manuscript: October 2, 2004
Manuscript Accepted: October 7, 2004
Published: March 20, 2005

J.-C. Chanteloup, "Multiple-wave lateral shearing interferometry for wave-front sensing," Appl. Opt. 44, 1559-1571 (2005)

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