Tunable waveguides via photo-oxidation of plasma-polymerized organosilicon films
Applied Optics, Vol. 44, Issue 9, pp. 1691-1697 (2005)
http://dx.doi.org/10.1364/AO.44.001691
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Abstract
Plasma-enhanced chemical vapor deposition (PECVD) of dimethylsilane and hexamethyldisilane produced thin films with a refractive index of 1.56 ± 0.01 at 633 nm. A decrease in the refractive index of approximately 3% was observed after irradiation with UV light from an ArF laser operating at 193 nm. Lower-intensity UV light from a Hg arc lamp induced a slower and controllable decrease in the refractive index. Top-side prism coupling showed the as-deposited organosilicon films to be multimode at 633 nm and single mode at 1550 nm. A model predicted that 30 s of UV irradiation with the Hg arc lamp would decrease the refractive index of the light-guiding film by approximately 0.01, converting the waveguide into single-mode operation across the spectrum of essential wavelengths for microphotonics. Irradiation followed by further coupling experiments confirmed this tunability. Trimming the refractive index of patternable organosilicon polymeric films presents a method of optimizing the coupling performance of PECVD microphotonic interconnect layers postdeposition.
© 2005 Optical Society of America
OCIS Codes
(130.2790) Integrated optics : Guided waves
(130.3130) Integrated optics : Integrated optics materials
(160.4670) Materials : Optical materials
(160.4890) Materials : Organic materials
(160.5470) Materials : Polymers
(230.7370) Optical devices : Waveguides
(240.0310) Optics at surfaces : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.2790) Thin films : Guided waves
(310.3840) Thin films : Materials and process characterization
Citation
John P. Lock and Karen K. Gleason, "Tunable waveguides via photo-oxidation of plasma-polymerized organosilicon films," Appl. Opt. 44, 1691-1697 (2005)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-44-9-1691
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