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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 45, Iss. 1 — Jan. 1, 2006
  • pp: 15–21

Optimization of anisotropically etched silicon surface-relief gratings for substrate-mode optical interconnects

Shun-Der Wu, Thomas K. Gaylord, Jonathan S. Maikisch, and Elias N. Glytsis  »View Author Affiliations


Applied Optics, Vol. 45, Issue 1, pp. 15-21 (2006)
http://dx.doi.org/10.1364/AO.45.000015


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Abstract

The optimum profiles of right-angle-face anisotropically etched silicon surface-relief gratings illuminated at normal incidence for substrate-mode optical interconnects are determined for TE, TM, and random linear (RL) polarizations. A simulated annealing algorithm in conjunction with the rigorous coupled-wave analysis is used. The optimum diffraction efficiencies of the - 1 forward-diffracted order are 37.3 % , 67.1 % , and 51.2 % for TE-, TM-, and RL-polarization-optimized profiles, respectively. Also, the sensitivities to grating thickness, slant angle, and incident angle of the optimized profiles are presented.

© 2006 Optical Society of America

OCIS Codes
(040.6040) Detectors : Silicon
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.1950) Diffraction and gratings : Diffraction gratings
(230.1950) Optical devices : Diffraction gratings

History
Original Manuscript: March 31, 2005
Revised Manuscript: June 2, 2005
Manuscript Accepted: June 2, 2005

Citation
Shun-Der Wu, Thomas K. Gaylord, Jonathan S. Maikisch, and Elias N. Glytsis, "Optimization of anisotropically etched silicon surface-relief gratings for substrate-mode optical interconnects," Appl. Opt. 45, 15-21 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-1-15

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