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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 45, Iss. 1 — Jan. 1, 2006
  • pp: 53–62

Zone-boundary optimization for direct laser writing of continuous-relief diffractive optical elements

Victor P. Korolkov, Ruslan K. Nasyrov, and Ruslan V. Shimansky  »View Author Affiliations


Applied Optics, Vol. 45, Issue 1, pp. 53-62 (2006)
http://dx.doi.org/10.1364/AO.45.000053


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Abstract

Enhancing the diffraction efficiency of continuous-relief diffractive optical elements fabricated by direct laser writing is discussed. A new method of zone-boundary optimization is proposed to correct exposure data only in narrow areas along the boundaries of diffractive zones. The optimization decreases the loss of diffraction efficiency related to convolution of a desired phase profile with a writing-beam intensity distribution. A simplified stepped transition function that describes optimized exposure data near zone boundaries can be made universal for a wide range of zone periods. The approach permits a similar increase in the diffraction efficiency as an individual-pixel optimization but with fewer computation efforts. Computer simulations demonstrated that the zone-boundary optimization for a 6 µm period grating increases the efficiency by 7% and 14.5% for 0.6 µm and 1.65 µm writing-spot diameters, respectively. The diffraction efficiency of as much as 65 % 90 % for 4 10 µm zone periods was obtained experimentally with this method.

© 2006 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(090.1760) Holography : Computer holography
(230.4000) Optical devices : Microstructure fabrication

Citation
Victor P. Korolkov, Ruslan K. Nasyrov, and Ruslan V. Shimansky, "Zone-boundary optimization for direct laser writing of continuous-relief diffractive optical elements," Appl. Opt. 45, 53-62 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-1-53


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