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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 45, Iss. 12 — Apr. 20, 2006
  • pp: 2567–2571

Deep-etched high-density fused-silica transmission gratings with high efficiency at a wavelength of 1550 nm

Shunquan Wang, Changhe Zhou, Yanyan Zhang, and Huayi Ru  »View Author Affiliations

Applied Optics, Vol. 45, Issue 12, pp. 2567-2571 (2006)

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We describe the design, fabrication, and excellent performance of an optimized deep-etched high-density fused-silica transmission grating for use in dense wavelength division multiplexing (DWDM) systems. The fabricated optimized transmission grating exhibits an efficiency of 87.1 % at a wavelength of 1550   nm . Inductively coupled plasma-etching technology was used to fabricate the grating. The deep-etched high-density fused-silica transmission grating is suitable for use in a DWDM system because of its high efficiency, low polarization-dependent loss, parallel demultiplexing, and stable optical performance. The fabricated deep-etched high-density fused-silica transmission gratings should play an important role in DWDM systems.

© 2006 Optical Society of America

OCIS Codes
(050.1380) Diffraction and gratings : Binary optics
(050.1950) Diffraction and gratings : Diffraction gratings
(060.1810) Fiber optics and optical communications : Buffers, couplers, routers, switches, and multiplexers
(060.4510) Fiber optics and optical communications : Optical communications
(230.1950) Optical devices : Diffraction gratings

Original Manuscript: August 22, 2005
Manuscript Accepted: October 6, 2005

Shunquan Wang, Changhe Zhou, Yanyan Zhang, and Huayi Ru, "Deep-etched high-density fused-silica transmission gratings with high efficiency at a wavelength of 1550 nm," Appl. Opt. 45, 2567-2571 (2006)

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