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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 45, Iss. 12 — Apr. 20, 2006
  • pp: 2773–2776

Theoretical investigation of the off-axis z-scan technique for nonlinear optical refraction measurement

Aleksandr I. Ryasnyansky and Bruno Palpant  »View Author Affiliations

Applied Optics, Vol. 45, Issue 12, pp. 2773-2776 (2006)

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The theoretical investigation of the off-axis z-scan technique for the measurement of nonlinear optical refraction in materials is presented. The normalized transmittance is calculated for different aperture radii and positions. The dependence of both the normalized transmittance amplitude ( Δ T pv ) and the distance between maximum and minimum ( Δ z pv ) on the aperture radius is analyzed. A condition for the applicability of the pinhole approximation is given.

© 2006 Optical Society of America

OCIS Codes
(160.4330) Materials : Nonlinear optical materials
(190.4180) Nonlinear optics : Multiphoton processes
(190.4360) Nonlinear optics : Nonlinear optics, devices
(190.4400) Nonlinear optics : Nonlinear optics, materials

Original Manuscript: September 9, 2005
Revised Manuscript: November 24, 2005
Manuscript Accepted: November 26, 2005

Aleksandr I. Ryasnyansky and Bruno Palpant, "Theoretical investigation of the off-axis z-scan technique for nonlinear optical refraction measurement," Appl. Opt. 45, 2773-2776 (2006)

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