OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 16 — Jun. 1, 2006
  • pp: 3688–3697

Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics

Tatiana Novikova, Antonello De Martino, Sami Ben Hatit, and Bernard Drévillon  »View Author Affiliations


Applied Optics, Vol. 45, Issue 16, pp. 3688-3697 (2006)
http://dx.doi.org/10.1364/AO.45.003688


View Full Text Article

Enhanced HTML    Acrobat PDF (2033 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

Fast and efficient metrology tools are required in microelectronics for control of ever-decreasing feature sizes. Optical techniques such as spectroscopic ellipsometry (SE) and normal incidence reflectometry are widely used for this task. In this work we investigate the potential of spectral Mueller polarimetry in conical diffraction for the characterization of 1D gratings, with particular emphasis on small critical dimensions (CDs). Mueller matrix spectra were taken in the visible ( 450 700   nm ) wavelength range on a photoresist grating on a Si substrate with 70 / 240   nm CD/period nominal values, set at nine different azimuthal angles. These spectra were fitted with a rigorous coupled-wave analysis (RCWA) algorithm by using different models for the grating profile (rectangular and trapezoidal, with or without rounded corners). A detailed study of the stability and consistency of the optimal CD values, together with the variation of the merit function (the mean square deviation D 2 ) around these values, clearly showed that for a given wavelength range, this technique can decouple some critical parameters (e.g., top and bottom CDs, left and right sidewall projections) much more efficiently than the usual SE.

© 2006 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(120.3940) Instrumentation, measurement, and metrology : Metrology

History
Original Manuscript: June 2, 2005
Revised Manuscript: September 22, 2005
Manuscript Accepted: September 29, 2005

Citation
Tatiana Novikova, Antonello De Martino, Sami Ben Hatit, and Bernard Drévillon, "Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics," Appl. Opt. 45, 3688-3697 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-16-3688


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. B. K. Minhas, S. A. Coulombe, S. Sohail, H. Naqvi, and J. R. McNeil, "Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures," Appl. Opt. 37, 5112-5115 (1998). [CrossRef]
  2. X.-T. Huang and F. L. Terry, Jr., Erratum to "Spectroscopic ellipsometry and reflectometry from grating (scatterometry) for critical dimension measurement and in situ, real-time process monitoring," [Thin Solid Films 455-456, 828-836 (2004)], Thin Solid Films 486, 339-346 (2004). [CrossRef]
  3. R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light, 2nd ed. (North-Holland, 1986).
  4. P. C. Logofatu, S. A. Coulombe, B. K. Minhas, and J. R. McNeil, "Identity of the cross-reflection coefficients for symmetric surface-relief gratings," J. Opt. Soc. Am. A 16, 1108-1114 (1999). [CrossRef]
  5. L. Li, "Symmetries of cross-polarization diffraction coefficients of gratings," J. Opt. Soc. Am. A 17, 881-887 (2000). [CrossRef]
  6. T. Novikova, A. De Martino, R. Ossikovski, and B. Drévillon, "Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics," Eur. Phys. J. Appl. Phys. 31, 63-69 (2005). [CrossRef]
  7. E. Garcia-Caurel, A. De Martino, and B. Drévillon, "Spectroscopic Mueller polarimeter based on liquid crystal devices," Thin Solid Films 455-456, 120-123 (2004). [CrossRef]
  8. E. Compain and B. Drévillon, "High frequency modulation of the four states of polarization of light with a single phase modulator," Rev. Sci. Instrum. 69, 1574-1580 (1998). [CrossRef]
  9. J. S. Tyo, "Design of optimal polarimeters: maximization of signal-to-noise ratio and minimization of systematic error," Appl. Opt. 41, 619-630 (2002). [CrossRef] [PubMed]
  10. A. De Martino, E. Garcia-Caurel, B. Laude, and B. Drévillon, "General methods for optimized design and calibration of Mueller polarimeters," Thin Solid Films 455-456, 112-119 (2004). [CrossRef]
  11. M. G. Moharam, E. B. Grann, D. A. Pommet, and T. K. Gaylord, "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," J. Opt. Soc. Am. A 12, 1068-1076 (1995). [CrossRef]
  12. L. Li, "Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings," J. Opt. Soc. Am. A 13, 1024-1035 (1996). [CrossRef]
  13. B. Kaplan, T. Novikova, A. De Martino, and B. Drévillon, "Characterization of bidimensional gratings by spectroscopic ellipsometry and angle-resolved Mueller polarimetry," Appl. Opt. 43, 1233-1240 (2004). [CrossRef] [PubMed]
  14. K. Narahari Rao, Molecular Spectroscopy: Modern Research, Vol. II (Academic, 1976).
  15. V. H. Press, S. A. Teukolsky, W. T. Vetterling, and B. P. Flannery, Numerical Recipes: the Art of Scientific Computing, 2nd ed. (Cambridge U. Press, 1992).
  16. M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach," J. Opt. Soc. Am. A 12, 1077-1086 (1995). [CrossRef]
  17. A. Weidner, M. Slodowski, C. Halm, C. Schneider, and L. Pfizner, "Effective-medium model for fast evaluation of scatterometric measurements on grating," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver, ed., Proc. SPIE 5375, 232-243 (2004). [CrossRef]
  18. M. Schubert, "Polarization-dependent optical parameters of arbitrarily anisotropic homogeneous layered systems," Phys. Rev. B 53, 4265-4274 (1996). [CrossRef]
  19. G. E. Jellison, Jr., "Data analysis for spectroscopic ellipsometry," Thin Solid Films 234, 416-422 (1993). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited