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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 45, Iss. 2 — Jan. 10, 2006
  • pp: 281–287

Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask

Fan Wang, Xiangzhao Wang, Mingying Ma, Dongqing Zhang, Weijie Shi, and Jianming Hu  »View Author Affiliations

Applied Optics, Vol. 45, Issue 2, pp. 281-287 (2006)

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As a critical dimension shrinks, the degradation in image quality caused by wavefront aberrations of projection optics in lithographic tools becomes a serious problem. It is necessary to establish a technique for a fast and accurate in situ aberration measurement. We introduce what we believe to be a novel technique for characterizing the aberrations of projection optics by using an alternating phase-shifting mask. The even aberrations, such as spherical aberration and astigmatism, and the odd aberrations, such as coma, are extracted from focus shifts and image displacements of the phase-shifted pattern, respectively. The focus shifts and the image displacements are measured by a transmission image sensor. The simulation results show that, compared with the accuracy of the previous straightforward measurement technique, the accuracy of the coma measurement increases by more than 30 % and the accuracy of the spherical-aberration measurement increases by approximately 20 % .

© 2006 Optical Society of America

OCIS Codes
(110.3000) Imaging systems : Image quality assessment
(110.5220) Imaging systems : Photolithography
(120.3940) Instrumentation, measurement, and metrology : Metrology
(220.4840) Optical design and fabrication : Testing

ToC Category:
Instrumentation, Measurement, and Metrology

Fan Wang, Xiangzhao Wang, Mingying Ma, Dongqing Zhang, Weijie Shi, and Jianming Hu, "Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask," Appl. Opt. 45, 281-287 (2006)

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