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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 22 — Aug. 1, 2006
  • pp: 5642–5650

Reflectance measurements and optical constants in the extreme ultraviolet–vacuum ultraviolet regions for SiC with a different CSi ratio

Denis Garoli, F. Frassetto, G. Monaco, P. Nicolosi, M.-G. Pelizzo, F. Rigato, V. Rigato, A. Giglia, and S. Nannarone  »View Author Affiliations


Applied Optics, Vol. 45, Issue 22, pp. 5642-5650 (2006)
http://dx.doi.org/10.1364/AO.45.005642


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Abstract

Reflectance versus incidence angle measurements have been performed from 5   to   152   nm on samples of SiC with a different C∕Si ratio deposited with rf magnetron sputtering. The optical constants of the material at different wavelengths have been determined by using a curve-fitting technique of reflectance values versus incidence angle. Complementary measurements of the incident beam polarization, film thickness, surface roughness, and stoichiometry were performed to complete the analysis of the samples.

© 2006 Optical Society of America

OCIS Codes
(160.4670) Materials : Optical materials
(240.0310) Optics at surfaces : Thin films
(310.0310) Thin films : Thin films
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Thin Films

History
Original Manuscript: November 17, 2005
Revised Manuscript: March 1, 2006
Manuscript Accepted: March 3, 2006

Citation
Denis Garoli, F. Frassetto, G. Monaco, P. Nicolosi, M.-G. Pelizzo, F. Rigato, V. Rigato, A. Giglia, and S. Nannarone, "Reflectance measurements and optical constants in the extreme ultraviolet-vacuum ultraviolet regions for SiC with a different C/Si ratio," Appl. Opt. 45, 5642-5650 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-22-5642

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