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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 23 — Aug. 10, 2006
  • pp: 5845–5855

High-speed phase-stepped digital speckle pattern interferometry using a complementary metal-oxide semiconductor camera

Tao Wu, Julian D. C. Jones, and Andrew J. Moore  »View Author Affiliations


Applied Optics, Vol. 45, Issue 23, pp. 5845-5855 (2006)
http://dx.doi.org/10.1364/AO.45.005845


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Abstract

A digital speckle pattern interferometer based on a complementary metal-oxide semiconductor (CMOS) camera is described. The temporal evolution of dynamic deformation is measured using interframe phase stepping. The flexibility of the CMOS detector is used to identify regions of interest with full-field time-averaged measurements and then to interrogate those regions with time-resolved measurements sampled at up to 70   kHz . A numerical and analytical investigation shows that the maximum surface velocity that can be reliably measured with interframe phase stepping corresponds to ±0.3 times the surface velocity at which the interferogram is sampled at the Nyquist limit.

© 2006 Optical Society of America

OCIS Codes
(060.2310) Fiber optics and optical communications : Fiber optics
(120.6160) Instrumentation, measurement, and metrology : Speckle interferometry
(120.7280) Instrumentation, measurement, and metrology : Vibration analysis

History
Original Manuscript: November 9, 2005
Manuscript Accepted: December 30, 2005

Citation
Tao Wu, Julian D. C. Jones, and Andrew J. Moore, "High-speed phase-stepped digital speckle pattern interferometry using a complementary metal-oxide semiconductor camera," Appl. Opt. 45, 5845-5855 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-23-5845

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