OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 23 — Aug. 10, 2006
  • pp: 5866–5870

Storage ring free-electron lasing at 176 nm—dielectric mirror development for vacuum ultraviolet free-electron lasers

Stefan Günster, Detlev Ristau, Alexandre Gatto, Norbert Kaiser, Mauro Trovó, and Miltcho Danailov  »View Author Affiliations


Applied Optics, Vol. 45, Issue 23, pp. 5866-5870 (2006)
http://dx.doi.org/10.1364/AO.45.005866


View Full Text Article

Enhanced HTML    Acrobat PDF (177 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

Mirrors for storage ring free-electron lasers in the vacuum ultraviolet must provide adequate reflectivity and resistance against synchrotron radiation. The free-electron laser system at ELETTRA (Trieste, Italy) is targeted to lase in the spectral range between 155 and 200   nm . It was demonstrated that dense oxide multilayer coatings allow lasing down to 189.9   nm . However, pure oxide systems show significant absorption at lower wavelengths and cannot be employed below 189.9 nm. Fluoride stacks can be deposited down to 130   nm with high reflection values above 95 % , but their resistance against the harsh synchrotron environment is poor. They rapidly degrade; lasing cannot be realized with this mirror approach. For the range between 170 and 190   nm , hybrid systems—combining fluoride and oxide materials—have been manufactured. With appropriate deposition procedures, mirrors achieve reflectance values up to 99 % and an adequate radiation resistance simultaneously. A mirror based on a conventional fluoride stack protected by a dense silicon dioxide protection layer was deposited and successfully employed for free-electron lasing at 176.4   nm .

© 2006 Optical Society of America

OCIS Codes
(140.2600) Lasers and laser optics : Free-electron lasers (FELs)
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties

History
Original Manuscript: March 1, 2005
Revised Manuscript: August 26, 2005
Manuscript Accepted: February 16, 2006

Citation
Stefan Günster, Detlev Ristau, Alexandre Gatto, Norbert Kaiser, Mauro Trovó, and Miltcho Danailov, "Storage ring free-electron lasing at 176 nm--dielectric mirror development for vacuum ultraviolet free-electron lasers," Appl. Opt. 45, 5866-5870 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-23-5866

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited