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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 45, Iss. 24 — Aug. 20, 2006
  • pp: 6086–6093

Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools

Fan Wang, Xiangzhao Wang, and Mingying Ma  »View Author Affiliations

Applied Optics, Vol. 45, Issue 24, pp. 6086-6093 (2006)

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As the feature size decreases, degradation of image quality caused by wavefront aberrations of projection optics in lithographic tools has become a serious problem in the low-k1 process. We propose a novel measurement technique for in situ characterizing aberrations of projection optics in lithographic tools. Considering the impact of the partial coherence illumination, we introduce a novel algorithm that accurately describes the pattern displacement and focus shift induced by aberrations. Employing the algorithm, the measurement condition is extended from three-beam interference to two-, three-, and hybrid-beam interferences. The experiments are performed to measure the aberrations of projection optics in an ArF scanner.

© 2006 Optical Society of America

OCIS Codes
(110.3000) Imaging systems : Image quality assessment
(110.5220) Imaging systems : Photolithography
(120.3940) Instrumentation, measurement, and metrology : Metrology
(220.4840) Optical design and fabrication : Testing

Original Manuscript: December 14, 2005
Revised Manuscript: March 10, 2006
Manuscript Accepted: March 14, 2006

Fan Wang, Xiangzhao Wang, and Mingying Ma, "Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools," Appl. Opt. 45, 6086-6093 (2006)

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