Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools
Applied Optics, Vol. 45, Issue 24, pp. 6086-6093 (2006)
http://dx.doi.org/10.1364/AO.45.006086
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Abstract
As the feature size decreases, degradation of image quality caused by wavefront aberrations of projection optics in lithographic tools has become a serious problem in the low-k1 process. We propose a novel measurement technique for in situ characterizing aberrations of projection optics in lithographic tools. Considering the impact of the partial coherence illumination, we introduce a novel algorithm that accurately describes the pattern displacement and focus shift induced by aberrations. Employing the algorithm, the measurement condition is extended from three-beam interference to two-, three-, and hybrid-beam interferences. The experiments are performed to measure the aberrations of projection optics in an ArF scanner.
© 2006 Optical Society of America
OCIS Codes
(110.3000) Imaging systems : Image quality assessment
(110.5220) Imaging systems : Photolithography
(120.3940) Instrumentation, measurement, and metrology : Metrology
(220.4840) Optical design and fabrication : Testing
History
Original Manuscript: December 14, 2005
Revised Manuscript: March 10, 2006
Manuscript Accepted: March 14, 2006
Citation
Fan Wang, Xiangzhao Wang, and Mingying Ma, "Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools," Appl. Opt. 45, 6086-6093 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-24-6086
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