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Applied Optics

Applied Optics


  • Vol. 45, Iss. 26 — Sep. 10, 2006
  • pp: 6746–6749

Silicon infrared diffuser for wireless communication

Ettore Massera, Ilaria Rea, Ivana Nasti, Pasqualino Maddalena, and Girolamo Di Francia  »View Author Affiliations

Applied Optics, Vol. 45, Issue 26, pp. 6746-6749 (2006)

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We show what we believe to be a novel way to use silicon in infrared radio communication as a suitable material for the realization of optical diffusers in the range of 850 1600   nm . A crystalline silicon wafer is made porous by means of electrochemical etching. The porous silicon produced is optically characterized, and measurements report a high reflectance in the band of interest. We also study the angular distribution of diffused radiation by the porous silicon surface at different angles of incident radiation. Measurements show that radiation diffuses in a quasi-Lambertian manner, confirming the good performance of this material as an incident radiation diffuser.

© 2006 Optical Society of America

OCIS Codes
(060.4510) Fiber optics and optical communications : Optical communications
(160.4670) Materials : Optical materials
(160.4760) Materials : Optical properties
(160.6030) Materials : Silica
(230.1980) Optical devices : Diffusers

Original Manuscript: October 7, 2005
Revised Manuscript: March 23, 2006
Manuscript Accepted: May 12, 2006

Ettore Massera, Ilaria Rea, Ivana Nasti, Pasqualino Maddalena, and Girolamo Di Francia, "Silicon infrared diffuser for wireless communication," Appl. Opt. 45, 6746-6749 (2006)

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