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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 28 — Oct. 1, 2006
  • pp: 7319–7324

Microstructure of magnesium fluoride films deposited by boat evaporation at 193 nm

Ming-Chung Liu, Cheng-Chung Lee, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano  »View Author Affiliations


Applied Optics, Vol. 45, Issue 28, pp. 7319-7324 (2006)
http://dx.doi.org/10.1364/AO.45.007319


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Abstract

Single layer magnesium fluoride ( MgF 2 ) was deposited on fused-silica substrates by a molybdenum boat evaporation process at 193 nm . The formation of various microstructures in relation to the different substrate temperatures and deposition rates were investigated. The relation between these microstructures (including cross-sectional morphology, surface roughness, and crystalline structures), the optical properties (including refractive index and optical loss) and stress, were all investigated. It was found that the laser-induced damage threshold (LIDT) would be affected by the microstructure, optical loss, and stress of the thin film. To obtain a larger LIDT value and better optical characteristics, MgF 2 films should be deposited at a high substrate temperature ( 300 °C ) and at a low deposition rate ( 0.05 nm s - 1 ) .

© 2006 Optical Society of America

OCIS Codes
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

ToC Category:
Thin Films

History
Original Manuscript: March 31, 2006
Manuscript Accepted: May 4, 2006

Citation
Ming-Chung Liu, Cheng-Chung Lee, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano, "Microstructure of magnesium fluoride films deposited by boat evaporation at 193 nm," Appl. Opt. 45, 7319-7324 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-28-7319

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