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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 28 — Oct. 1, 2006
  • pp: 7519–7523

Fabrication and characterization of microstructures with optical quality surfaces in fused silica glass using femtosecond laser pulses and chemical etching

Yuri Sikorski, Corneliu Rablau, Mark Dugan, Ali A. Said, Philippe Bado, and Lars Guenter Beholz  »View Author Affiliations


Applied Optics, Vol. 45, Issue 28, pp. 7519-7523 (2006)
http://dx.doi.org/10.1364/AO.45.007519


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Abstract

We present a study of the sidewall surface quality inside microchannels fabricated in fused silica glass by femtosecond laser pulses and chemical etching. Multiple combinations of laser exposure and etching solution parameters were examined. Results of scanning electron microscopy, atomic force microscopy, and optical reflection analyses of the surfaces are presented. The results obtained demonstrate the feasibility of optical quality surface fabrication, which in turn demonstrates the feasibility of fabricating complex integrated devices containing microfluidic channels and optical waveguides in the glass substrates.

© 2006 Optical Society of America

OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(140.7090) Lasers and laser optics : Ultrafast lasers
(160.2750) Materials : Glass and other amorphous materials
(320.2250) Ultrafast optics : Femtosecond phenomena
(320.7130) Ultrafast optics : Ultrafast processes in condensed matter, including semiconductors
(350.3390) Other areas of optics : Laser materials processing

ToC Category:
Ultrafast Optics

History
Original Manuscript: January 17, 2006
Revised Manuscript: April 25, 2006
Manuscript Accepted: May 2, 2006

Virtual Issues
Vol. 1, Iss. 11 Virtual Journal for Biomedical Optics

Citation
Yuri Sikorski, Corneliu Rablau, Mark Dugan, Ali A. Said, Philippe Bado, and Lars Guenter Beholz, "Fabrication and characterization of microstructures with optical quality surfaces in fused silica glass using femtosecond laser pulses and chemical etching," Appl. Opt. 45, 7519-7523 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-28-7519

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