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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 32 — Nov. 10, 2006
  • pp: 8278–8287

Applying an interferometric exposure model to analyze the influences of process parameters on the linewidth

Cheng-Wei Chien, Jyh-Chen Chen, and Ju-Yi Lee  »View Author Affiliations


Applied Optics, Vol. 45, Issue 32, pp. 8278-8287 (2006)
http://dx.doi.org/10.1364/AO.45.008278


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Abstract

We utilize a modified interferometric exposure model, enhanced with the Beer–Lambert law, to study how some process parameters influence the structural dimensions within the whole exposure area. An experimental apparatus is built to verify the accuracy of this model. The simulation results indicate that when the incident angle is larger than 15°, the effect of the beam deformation cannot be neglected. One cannot readily obtain periodic structures with the same dimensions during static exposure because of the Gaussian distribution of the light intensity. The theoretical results match the experimental ones quite well. The variation of Dill's parameter A has a greater influence on the transmittance and the linewidth when A is decreasing. If a poor contrast fringe is exposed in the photoresist, it will not only cause a greater nonuniformity of the structural dimensions but also a decreased aspect ratio in the structure after the development process.

© 2006 Optical Society of America

OCIS Codes
(220.4000) Optical design and fabrication : Microstructure fabrication
(260.3160) Physical optics : Interference

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: May 25, 2006
Revised Manuscript: July 6, 2006
Manuscript Accepted: July 7, 2006

Citation
Cheng-Wei Chien, Jyh-Chen Chen, and Ju-Yi Lee, "Applying an interferometric exposure model to analyze the influences of process parameters on the linewidth," Appl. Opt. 45, 8278-8287 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-32-8278

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